Structural and electrical properties of (Na 0.85 K 0.15 ) 0.5 Bi 0.5 TiO 3 thin films deposited on LaNiO 3 and Pt bottom electrodes

Applied Surface Science

Volumn 256, Issue 10, 2010, Pages 3316-3320

  Zheng, X J ^a   Dai, S H ^a   Feng, X ^b   Zhang, T ^c   Zhang, D Z ^a   Gong, Y Q ^a   Chen, Y Q ^a   He, L ^a  

^a XIANGTAN UNIVERSITY   (China)

^b TSINGHUA UNIVERSITY   (China)

^c JILIN UNIVERSITY   (China)

Author keywords

(Na 0.85 K 0.15 ) 0.5 Bi 0.5 TiO 3 thin film; Bottom electrode; Dielectric; Metal organic decomposition; Piezoelectric; Porosity

Indexed keywords

BISMUTH COMPOUNDS; DECOMPOSITION; DIELECTRIC LOSSES; DIELECTRIC MATERIALS; ELECTRODES; FERROELECTRIC FILMS; FERROELECTRICITY; LANTHANUM COMPOUNDS; NICKEL COMPOUNDS; ORGANOMETALLICS; PIEZOELECTRICITY; PLATINUM; POROSITY; SCANNING PROBE MICROSCOPY; SODIUM COMPOUNDS; THIN FILM DEVICES; THIN FILMS; TITANIUM OXIDES;

BOTTOM ELECTRODES; DIELECTRIC AND PIEZOELECTRIC PROPERTIES; METAL ORGANIC DECOMPOSITION; PIEZOELECTRIC; PIEZOELECTRIC PROPERTY; PIEZOELECTRIC THIN FILM DEVICES; REMNANT POLARIZATIONS; STRUCTURAL AND ELECTRICAL PROPERTIES;

POTASSIUM COMPOUNDS;

EID: 77649186474     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.12.026     Document Type: Article

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