Effect of oxygen to argon ratio on properties of (Ba,Sr)TiO3 thin films prepared by radio-frequency magnetron sputtering

Journal of Applied Physics

Volumn 82, Issue 7, 1997, Pages 3482-3487

  Tsai, M S ^a   Sun, S C ^a,b   Tseng, T Y ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001634079     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365665     Document Type: Article

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