The influence of the electrical field on structures dimension measurement in electrostatic force microscopy mode

Optica Applicata

Volumn 39, Issue 4, 2009, Pages 933-941

  Sikora, Andrzej ^a  

^a ELECTROTECHNICAL INSTITUTE   (Poland)

Author keywords

Atomic force microscopy (AFM); Dimensions measurement accuracy; Electrostatic force microscopy (EFM)

Indexed keywords

AFM; DATA MATRICES; ELECTRIC BEHAVIOR; ELECTRICAL FIELD; ELECTROSTATIC DISTRIBUTIONS; ELECTROSTATIC FORCE MICROSCOPY; MEASUREMENT ACCURACY; NANO SCALE; NEW DEVICES; SURFACE ELECTRIC PROPERTIES;

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; ELECTRIC TOOLS; ELECTROSTATIC DEVICES; ELECTROSTATIC FORCE; SURFACE TOPOGRAPHY; TWO DIMENSIONAL;

ELECTRIC FORCE MICROSCOPY;

EID: 77449149954     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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