High resolution imaging of contact potential difference using a novel ultrahigh vacuum non-contact atomic force microscope technique

Applied Surface Science

Volumn 140, Issue 3-4, 1999, Pages 265-270

  Kitamura, Shinichi ^a   Suzuki, Katsuyuki ^a   Iwatsuki, Masashi ^a  

^a JEOL LTD   (Japan)

Author keywords

07.79.Lh; 61.16.Ch; 73.30.+y; 73.40.Cg; Ag Si (111) 7 7; APN; CPD; Force gradient; PL; Polypropylene; Potential image; SKPM; UHV NC AFM; WE; Work function

Indexed keywords

EID: 0000718974     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00538-8     Document Type: Article

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