Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma

Applied Physics Letters

Volumn 96, Issue 7, 2010, Pages

  Lee, Hyo Chang ^a   Lee, Min Hyong ^a   Chung, Chin Wook ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS POWER; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; GAS PRESSURES; MAXWELLIAN DISTRIBUTION; PLASMA PARAMETER; POWER DISSIPATION; TOTAL POWER;

DISTRIBUTION FUNCTIONS; ELECTRON ENERGY ANALYZERS; ELECTRON TEMPERATURE; GAS ABSORPTION; INDUCTIVELY COUPLED PLASMA; PLASMA DENSITY; PLASMA JETS;

ELECTRIC DISCHARGES;

EID: 77249166678     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3293295     Document Type: Article

References (17)

1. J. W. Coburn and H. F. Winters, J. Appl. Phys. 0021-8979 50, 3189 (1979). 10.1063/1.326355 (Pubitemid 10469931)
2. J. H. Keller, J. C. Forster, and M. S. Barnes, J. Vac. Sci. Technol. A 0734-2101 11, 2487 (1993). 10.1116/1.578597
3. G. A. Hebner and P. A. Miller, J. Appl. Phys. 0021-8979 87, 7660 (2000). 10.1063/1.373437
4. D. S. Wuu, C. R. Chung, Y. H. Liu, R. H. Horng, and S. H. Huang, J. Vac. Sci. Technol. B 1071-1023 20, 902 (2002). 10.1116/1.1475983 (Pubitemid 34751272)
5. N. O. V. Plank, M. A. Blauw, E. W. J. M. van der Drift, and R. Cheung, J. Phys. D 0022-3727 36, 482 (2003). 10.1088/0022-3727/36/5/310
6. S. I. Imai, J. Vac. Sci. Technol. B 1071-1023 26, 2008 (2008). 10.1116/1.3021031
7. M. C. Chiang, F. M. Pan, H. C. Cheng, J. S. Liu, S. H. Chan, and T. C. Wei, J. Vac. Sci. Technol. A 0734-2101 18, 181 (2000). 10.1116/1.582135 (Pubitemid 30896795)
8. S. J. Pearton, C. R. Abernathy, and F. Ren, Appl. Phys. Lett. 0003-6951 64, 2294 (1994). 10.1063/1.111648
9. M. A. Sobolewski and J. H. Kim, J. Appl. Phys. 0021-8979 102, 113302 (2007). 10.1063/1.2815674 (Pubitemid 350262074)
10. M. H. Lee, H. C. Lee, and C. W. Chung, Appl. Phys. Lett. 0003-6951 93, 231503 (2008). 10.1063/1.3042264
11. H. C. Lee, M. H. Lee, and C. W. Chung, Phys. Plasmas 1070-664X 17, 013501 (2010).
12. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. 0963-0252 1, 36 (1992). 10.1088/0963-0252/1/1/006
13. J. I. Fernández Palop, J. Ballesteros, V. Colomer, and M. A. Hernandez, Rev. Sci. Instrum. 0034-6748 66, 4625 (1995). 10.1063/1.1145300
14. M. A. Lieberman and A. J. Lichtenberg, Principle of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, New York, 2004).
15. V. A. Godyak and R. B. Piejak, Phys. Rev. Lett. 0031-9007 65, 996 (1990). 10.1103/PhysRevLett.65.996
16. H. C. Lee, M. H. Lee, and C. W. Chung, Appl. Phys. Lett. 0003-6951 96, 041503 (2010).
17. V. A. Godyak, V. P. Meytlis, and H. R. Strauss, IEEE Trans. Plasma Sci. 0093-3813 23, 728 (1995). 10.1109/27.467995