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Volumn 18, Issue 1, 2000, Pages 181-187
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Dry etching of platinum films with TiN masks in an Ar/O2 helicon wave plasma
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON;
AUGER ELECTRON SPECTROSCOPY;
DRY ETCHING;
OXYGEN;
PLASMAS;
PLATINUM;
SILICA;
TIN COMPOUNDS;
X RAY PHOTOELECTRON SPECTROSCOPY;
HIGH ETCH SELECTIVITY;
OXYGEN CONCENTRATION;
SILICON OXIDE MASKS;
THIN FILMS;
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EID: 0033689688
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.582135 Document Type: Article |
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Times cited : (16)
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References (2)
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