Fluorine plasma treatments of poly(propylene) films, 2 - Modeling reaction mechanisms and scalinga

Plasma Processes and Polymers

Volumn 7, Issue 2, 2010, Pages 123-150

  Yang, Yang ^b   Strobel, Mark ^c   Kirk, Seth ^c   Kushner, Mark J ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b Iowa State University of Science and Technology   (United States)

^c 3M COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATED PROCESS; C-C BONDS; CAPACITIVELY COUPLED PLASMAS; ENERGETIC ION; F/C RATIO; FLUORINE PLASMA; FUNCTIONALIZATIONS; H-ABSTRACTION; HYDROCARBON POLYMERS; MODELING REACTIONS; PHOTON FLUX; PLASMA EXPOSURE; PLASMA FLUORINATION; PP FILMS; STERIC HINDRANCES; SURFACE COMPOSITIONS; SURFACE ENERGIES; SURFACE REACTION MECHANISM; TWO-DIMENSIONAL PLASMA;

ABSTRACTING; ATOMS; FLUORINATION; FLUORINE; FUNCTIONAL POLYMERS; HALOGENATION; HYDROCARBONS; INDUCTIVELY COUPLED PLASMA; IONS; ORGANIC POLYMERS; PASSIVATION; PHOTONS; PROPYLENE; SURFACE CHEMISTRY; SURFACE PROPERTIES; SURFACE TENSION; TWO DIMENSIONAL;

SURFACE REACTIONS;

EID: 77049122596     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900114123     Document Type: Article

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