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Volumn 98, Issue 3, 2010, Pages 565-569

Energy distribution of channel electrons and its impacts on the gate leakage current in graphene field-effect transistors

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL ELECTRONS; CONDUCTION BAND OFFSET; ENERGY DISTRIBUTIONS; ENERGY-MOMENTUM RELATION; GATE OXIDE; GATE-LEAKAGE CURRENT; GRAPHENES; HIGH-ENERGY ELECTRON; LINEAR ENERGY; NUMERICAL CALCULATION; SILICON ELECTRONICS; SURFACE ELECTRON DENSITY;

EID: 76749091474     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-009-5509-3     Document Type: Article
Times cited : (5)

References (15)
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    • Zhang, Y.1    Tan, Y.-W.2    Stormer, H.L.3    Kim, P.4
  • 9
    • 43949097921 scopus 로고    scopus 로고
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    • DOI 10.1063/1.2917284
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    • Ryzhii, V.1    Ryzhii, M.2    Satou, A.3    Otsuji, T.4
  • 12
    • 0036470701 scopus 로고    scopus 로고
    • Improved model for the stress-induced leakage current in thin silicon dioxide based on conduction-band electron and valence-band electron tunneling
    • DOI 10.1063/1.1429799
    • W.K. Chim P.S. Lim 2002 J. Appl. Phys. 91 1577 10.1063/1.1429799 2002JAP....91.1577C (Pubitemid 34148835)
    • (2002) Journal of Applied Physics , vol.91 , Issue.3 , pp. 1577
    • Chim, W.K.1    Lim, P.S.2
  • 14
    • 0003864761 scopus 로고
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  • 15
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    • 10.1063/1.331336 1982JAP.53.5052W
    • Z.A. Weinberg 1982 J. Appl. Phys. 53 5052 10.1063/1.331336 1982JAP....53.5052W
    • (1982) J. Appl. Phys. , vol.53 , pp. 5052
    • Weinberg, Z.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.