Silver films deposited by liquid-delivery MOCVD using (Tertbutylcarboxylate)(Triethylphosphine) silver with toluene as the solvent

ECS Transactions

Volumn 25, Issue 8 PART 2, 2009, Pages 1039-1046

  Lisca, M ^a   Kalkofen, B ^a   Lisker, M ^a   Burte, E P ^a   Szymanska I B ^b   Szlyk E ^b  

^a OTTO VON GUERICKE UNIVERSITY   (Germany)

^b NICOLAUS COPERNICUS UNIVERSITY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

AG FILMS; CRYSTALLINE ORIENTATIONS; DIFFERENT SUBSTRATES; ELECTRICAL PROPERTY; FILM COMPOSITION; FILM MORPHOLOGY; LIQUID DELIVERY MOCVD; LOW RESISTIVITY; METALLIC SILVER; METALORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE; POTENTIAL APPLICATIONS; SILVER FILM; SILVER ISLANDS; TIO; TRIETHYLPHOSPHINE;

DEPOSITION; ELECTRIC PROPERTIES; LIQUIDS; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANIC SOLVENTS; ORGANOMETALLICS; REACTION KINETICS; SURFACE STRUCTURE; TOLUENE;

SILVER;

EID: 76549137153     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3207703     Document Type: Conference Paper

References (19)

1. X.Sun, J.Shao, Appl. Surf. Sci. 253, 2093 (2006).
2. Y. Dirix, C. Bastiaansen, W. Caseri, P. Smith, Adv. Mater. 11, 223 (1999).
3. E. Moulin, J. Sukmanovski, M. Schulte, A. Gordjin, F.X. Royer, H. Stiebig, Thin Solid Films 516, 6813 (2008).
4. H. Kim, H. Jeong, S.J. Bao, G. Zhang, Mater. Lett., 59, 2194 (2005).
5. S. Nie, S.R.Emory, Science, 275, 1102 (1997).
6. D.W. Sheel, L. A. Brook, H. M. Yates, Chem. Vap. Dep., 14, 14 (2008).
7. P. Piszczek, E. Szłyk, M. Chaberski, C. Taeschner, A. Leonhard, W. Bała, K. Bartkiewicz, Chem. Vap. Dep., 11, 53 (2005).
8. I. Szymańska, P. Piszczek, R. Szczȩsny, E. Szłyk, Polyhedron, 26, 2440 (2007).
9. C. Friesen, S.C. Seel, C.V. Thompson, J. Appl. Phys., 95, 1011, (2004).
10. S.P. Murarka, R.J. Gutmann, A.E. Kaloyeros, W.A. Lanford, Thin Solid Films, 236, 257(1993).
11. S.K. Sharma, J. Spitz, Thin Solid Films, 65, 339 (1980).
12. K. Sieradzki, K. Bailey, T.L. Alford, Appl. Phys. Lett., 79, 3401 (2001).
13. C. Pennetta, L. Reggiani, G. Trefan, Phys Rev. Lett., 84, 5006 (2001).
14. H.C. Kim, T.L. Alford, D.R. Allee, Appl. Phys. Lett., 81, 4287 (2002).
15. O. Akhavan, A.Z. Moshfegh, Appl. Surf. Sci., 254, 548 (2007).
16. R.E. Hummel, H.J. Geier, Thin Solid Films, 25, 335 (1975).
17. Y. Ritterhaus, T. Hur'yeva, M. Lisker, E.P. Burte, Chem. Vap. Dep., 13, 698 (2007).
18. J.F. Moulder, W.F. Stickle, P.E. Sobol and K.D. Bomben in Handbook of X-ray Photoelectron Spectroscopy, J. Chastail and R.C. King, Editors, p. 58, Physical Electronics Inc., Minnesota (1995).
19. B.W. Sheldon, A. Rajamani, A. Bhandari, E. Chason, S.K. Hong, R. Beresford, J. Appl. Phys., 98, 43509 (2005).