Controlled nanostructured silver coated surfaces by atmospheric pressure chemical vapour deposition

Chemical Vapor Deposition

Volumn 14, Issue 1-2, 2008, Pages 14-24

  Sheel, David W ^a   Brook, Lucy A ^a   Yates, Heather M ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

Biocidal; Flame assisted CVD; Growth rate; Nanostructure; Silver films

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CHEMICAL VAPOR DEPOSITION; CLIMATOLOGY; METEOROLOGY; NANOSTRUCTURES; ORGANIC POLYMERS; SURFACE STRUCTURE; SURFACE TOPOGRAPHY; THICK FILMS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOUR DEPOSITIONS; BIOCIDAL; BIOCIDAL ACTIVITIES; CHEMICAL VAPOUR DEPOSITIONS; COATED SURFACES; DEGREE OF CONTROLS; FLAME ASSISTED CVD; LOW COSTS; LOW TOXICITIES; NANOSTRUCTURED; POTENTIAL APPLICATIONS; SILVER FILMS; SILVER LAYERS; SILVER SURFACES;

SILVER;

EID: 45349089414     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200706654     Document Type: Article

References (33)

1. H. Sun, Y. Y. Zhang, Sens. Actuators 2005,108, 925.
2. M. W. Xu, S. J. Bao, X. G. Zhang, Mater. Lett. 2005, 59, 2194.
3. H. Kim, H. Jeong, K. S. Kim, S. H. Yoon, S. S. Lee, K. W. Seo, I. Shim, Thin Solid Films 2005,478,72
4. W. Zhang, S. H. Brongersma, O. Richard, B. Brijs, R. Palmans, L. Froyen, K. Maex, Microelectron. Eng. 2004, 76, 146.
5. S. Chandra, J. N. Sharma, V. K. Mohabey, R. C. Agrawl, J. Appl. Phys. D 1980, 13, 495.
6. H. Tong, L. Zhu, M. Li, C. C. Wang, Electrochem. Acta 2003, 48, 2473.
7. G. O. Mallroy, J. B. Hajdu, Electroless Plating - Fundamentals and Applications, William Andrew Publishing/Noyes 1990, 538.
8. Z. Liu, X. Wang, H. Wu, C. Li, J. Colloid and Interface Science 2005, 257, 604.
9. D. Depla, R. DeGryse, Vacuum 2003, 69, 529.
10. Y. S. Jung, Appl. Surf. Science 2004, 221, 281.
11. T. L. Alford, L. Chen, K. S. Gadre, Thin Solid Films 2003, 429, 248.
12. L. Gao, P. Harter, C. Linsmeiner, A. Wiltner, R. Emling, D. S. Landsied, Microelectron. Eng. 2005, 82,296.
13. C. Gill, M. A. Villegas, J. M. F. Navarro, J.. European Ceramic Soc. 2005, 25, 711.
14. R. McCurdy, M. Soubeyrand, Electrochem. Soc. Proc. 1997, 11, 463.
15. B. Kirkbride, D. W. Sheel, S. Hurst, Coating of moving flat glass by Chemical Vapour Deposition. 1999: United Kingdom, p. 755902.
16. R. McCurdy, Int. Conf. on Coatings on Glass (ICCG), 1998, 100.
17. A. Grodzickla, I. Lakomska, K. Piszcze, I. Smzmanka, E. Szlyk, coord. Chem. Rev. 2005, 249, 2232.
18. M. Abourida, H. Guillon, C. Jimenez, J. M. Decams, F. Weiss, O. Valet, P. Doppelt, Electrochem. Soc. Proc. 2003, 2003-08, 938.
19. D. A. Edwards, M. R. Harker, M. F. Mahon, K. C. Molloy, Inorg. Chemica Acta 2002, 525, 134.
20. N. Bahlawane, P. A. Premkumar, A. Brechling, G. Reiss, K. KohseHoinghaus, Chem. Vap. Deposition 2007, 3, 401
21. H. Keskinen, J. M. Makela, M. Aromaa, J. Keskinen, S. Areva, C. V. Teixeira, J. B. Rosenholm, V. Pore, M. Ritala, M. Leskela, M. Raulio, M. S. Salkinoja-Salonen, E. Levanen, T. Mantyla, Cat. Lett. 2006, 111, 127.
22. L. A. Brook, P. Evans, H. A. Foster, M. E. Pemble, A. Steele, D. W. Steel, H.M.Yates, J. Photochem. Photobiol. A 2007, 187, 53.
23. C. Friesen, S. C. Seel, C. V. Thompson, J. Appl. Phys. 2004, 95, 1011.
24. P. D. Godbole, A. Mitra, R. Pasricha, A. B. Mandale, K. R. Patil, Mater. Lett. 2005, 59, 1958.
25. B. D. Cullity, S. R. Stock, Elements of XRD. 1978.
26. Z. Lin, C. Zhou, J. Wu, J. Zhou, L. Wang, Spectrochemica Acta A 2005, 61, 1195.
27. P. L. Taylora, O. Omotosob, J. B. Wiskela, D. Mitlina, R. E. Burrell, Biomaterials 2005, 26, 7230.
28. J Chastain, R. C. King, Handbook of X-Ray Photoelectron Spectroscopy, Physical Electronic Inc, New York, 1995.
29. T. Ung, L. M. Liz-Marzan, P. Mulvaney, Colloids and Surfaces A 2002, 202, 119.
30. S. Link, M. A. El-Sayed, J. Phys. Chem. B 1999, 103, 8410.
31. R. G. Palgrave, I. P. Parkin, Chem. Mater. 2007, 19, 4639.
32. B. W. Sheldon, A. Rajamani, A. Bhandari, E. Chason, S. K. Hong, R. Beresford, J.Appl. Phys. 2005, 95, 43509.
33. A. Galdikas, Surf. Science 2006, 600, 2705.