Surface termination and hydrogen bubble adhesion on Si(1 0 0) surfaces during anisotropic dissolution in aqueous KOH

Journal of Electroanalytical Chemistry

Volumn 597, Issue 1, 2006, Pages 1-12

  Haiss, Wolfgang ^a   Raisch, Philipp ^a   Bitsch, Lennart ^a   Nichols, Richard J ^a   Xia, Xinghua ^b   Kelly, John J ^b   Schiffrin, David J ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Anisotropic etching; Bubble adhesion; FTIR spectroscopy; Hillock formation; Micromachining; Si(1 0 0); Silicon etching

Indexed keywords

ANISOTROPY; DISSOLUTION; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROMACHINING; POTASSIUM COMPOUNDS; SURFACE STRUCTURE;

ANISOTROPIC ETCHING; BUBBLE ADHESION; HILLOCK FORMATION; HYDROGEN BUBBLE ADHESION; SILICON ETCHING; SURFACE TERMINATION;

ADHESION;

EID: 33749359671     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2006.07.027     Document Type: Article

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