Quenching of reducing properties of mesoporous silicon and its use as template for metal/semiconductor deposition

Journal of the Electrochemical Society

Volumn 157, Issue 3, 2010, Pages

  Kumar, Pushpendra ^a   Huber, Patrick ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; COPPER PLATING; CRYSTALLINE MATERIALS; EPILAYERS; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SURFACE CHEMISTRY; X RAY DIFFRACTION ANALYSIS; DEPOSITION; ELECTROPLATING; MESOPOROUS MATERIALS; NANOCRYSTALLINE SILICON; NANOCRYSTALS; PLATING; SILICON; X RAY DIFFRACTION;

BROAD SIZE DISTRIBUTION; COPPER CRYSTALS; COPPER FILMS; COPPER SULFATE; CUPROUS OXIDE; DEGREE OF OXIDATIONS; EXTERNAL CURRENTS; FACE-CENTERED CUBIC; IMMERSION PLATING; IR SPECTROSCOPY; IRREGULAR SHAPE; MEAN PORE DIAMETERS; MESOPOROUS; MESOPOROUS SILICON; METAL DEPOSITION; MICROMETER SCALE; NANO CHANNELS; NANOCRYSTALLINES; PORE LENGTH; POROUS LAYERS; POROUS SILICON SURFACES; QUANTUM CONFINEMENT EFFECTS; SINGLE COPPER; MESOPOROUS SURFACES;

POROUS SILICON;

EID: 76349086069     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3289734     Document Type: Article

References (41)

1. A. Ulhir, Bell Syst. Tech. J. BSTJAN 0005-8580, 35, 333 (1956); T. R. Turner, J. Electrochem. Soc. JESOAN 0013-4651, 105, 402 (1958). 10.1149/1.2428873
2. L. T. Canham, Appl. Phys. Lett. APPLAB 0003-6951, 57, 1046 (1990) 10.1063/1.103561; V. Lehmann and U. Gösele, Appl. Phys. Lett. APPLAB 0003-6951, 58, 856 (1991). 10.1063/1.104512
3. S. Godefroo, M. Hayne, M. Jivanescu, A. Stesmans, M. Zacharias, O. I. Lebedev, G. Van Tendeloo, and V. V. Moshchalkov, Nat. Nanotechnol. NNAABX 1748-3387, 3, 174 (2008). 10.1038/nnano.2008.7 (Pubitemid 351355145)
4. A. Richter, P. Steiner, F. Kozlowski, and W. Lang, IEEE Electron Device Lett. EDLEDZ 0741-3106, 12, 691 (1991). 10.1109/55.116957
5. G. Smestad, M. Kunst, and C. Vial, Sol. Energy Mater. Sol. Cells SEMCEQ 0927-0248, 26, 277 (1992). 10.1016/0927-0248(92)90047-S
6. G. Willeke, H. Nussbaumer, H. Bender, and E. Bucher, Sol. Energy Mater. Sol. Cells SEMCEQ 0927-0248, 26, 345 (1992). 10.1016/0927-0248(92)90054-S
7. J. P. Proot, C. Delerue, and G. Allan, Appl. Phys. Lett. APPLAB 0003-6951, 61, 1948 (1992). 10.1063/1.108372
8. V. Lehmann, Mater. Lett. MLETDJ 0167-577X, 28, 245 (1996). 10.1016/0167-577X(96)00102-4
9. A. Janshoff, K. P. S. Dancil, C. Steinem, D. P. Greiner, V. S. Y. LC. Gurtner, K. Motesharei, M. J. Sailor, and M. R. Ghadiri, J. Am. Chem. Soc. JACSAT 0002-7863, 120, 12108 (1998). 10.1021/ja9826237 (Pubitemid 29012882)
10. S. Chan, S. Kwon, T. W. Koo, L. P. Lee, and A. A. BerlAdv. Mater. ADVMEW 0935-9648, 15, 1595 (2003) 10.1002/adma.200305149; A. Yu. PanarV. S. Chirvony, K. I. Kholostov, P. Y. Turpand S. N. Terekhov, J. Appl. Spectrosc. JASYAP 0021-9037, 76, 280 (2009). 10.1007/s10812-009-9175-1
11. Panarin, A.Yu., Chirvony, V.S., Kholostov, K.I., Turpin, P.-Y., Terekhov, S.N., 2009, Formation of SERS-active silver structures on the surface of mesoporous silicon, , 76(2), 280-287
12. N. E. Chayen, E. Saridakis, R. El-Bahar, and Y. Nemirovsky, J. Mol. Biol. JMOBAK 0022-2836, 312, 591 (2001) 10.1006/jmbi.2001.4995; N. E. Chayen, E. Saridakis, and R. P. Sear, Proc. Natl. Acad. Sci. U.S.A. PNASA6 0027-8424, 103, 597 (2006) 10.1073/pnas.0504860102; A. J. Page and R. P. Sear, Phys. Rev. Lett. PRLTAO 0031-9007, 97, 065701 (2006) 10.1103/PhysRevLett.97.065701; D. Frenkel, Nature (London) NATUAS 0028-0836, 443, 641 (2006). 10.1038/443641a
13. S. P. Low, N. H. Voelcker, L. T. Canham, and K. A. Williams, Biomaterials BIMADU 0142-9612, 30, 2873 (2009). 10.1016/j.biomaterials.2009.02.008
14. X. G. Zhang, J. Electrochem. Soc. JESOAN 0013-4651, 151, C69 (2004) 10.1149/1.1632477; C. T. Black, K. W. Guarini, G. Breyta, M. C. Colbum, R. Ruiz, R. L. Sandstrom, E. M. Sikorski, and Y. Zhang, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 24, 3188 (2006). 10.1116/1.2366700
15. P. Kumar, T. Hofmann, K. Knorr, P. Huber, P. Scheib, and P. Lemmens, J. Appl. Phys. JAPIAU 0021-8979, 103, 024303 (2008). 10.1063/1.2829813 (Pubitemid 351190740)
16. K. Knorr, P. Huber, and D. Wallacher, Z. Phys. Chem. ZPCFAX 0942-9352, 222, 257 (2008) 10.1524/zpch.2008.222.2-3.257; A. V. Kityk, M. Wolff, K. Knorr, D. Morineau, R. Lefort, and P. Huber, Phys. Rev. Lett. PRLTAO 0031-9007, 101, 187801 (2008). 10.1103/PhysRevLett.101.187801
17. S. Gruener and P. Huber, Phys. Rev. Lett. PRLTAO 0031-9007, 100, 064502 (2008). 10.1103/PhysRevLett.100.064502
18. K. Rumpf, P. Granitzer, and H. Krenn, J. Phys.: Condens. Matter JCOMEL 0953-8984, 20, 454221 (2008). 10.1088/0953-8984/20/45/454221
19. D. Andsager, J. Hilliard, J. M. Hetrick, L. H. AbuHassan, M. Plisch, and M. H. Nayfeh, J. Appl. Phys. JAPIAU 0021-8979, 74, 4783 (1993). 10.1063/1.354350
20. N. Koshida and H. Koyama, Appl. Phys. Lett. APPLAB 0003-6951, 60, 347 (1992). 10.1063/1.106652
21. F. A. Harraz, K. Kamada, K. Kobayashi, T. Sakka, and Y. H. Ogata, J. Electrochem. Soc. JESOAN 0013-4651, 152, C213 (2005). 10.1149/1.1864292
22. P. Kumar and P. Huber, J. Phys. D: Appl. Phys. JPAPBE 0022-3727, 40, 2864 (2007). 10.1088/0022-3727/40/9/030 (Pubitemid 46646719)
23. G. Oskam, J. G. Long, A. Natarajan, and P. C. Searson, J. Phys. D: Appl. Phys. JPAPBE 0022-3727, 31, 1927 (1998). 10.1088/0022-3727/31/16/001
24. K. Tatsumura, T. Watanabe, K. Hara, T. Hoshino, and I. Ohdomari, Phys. Rev. B PRBMDO 0163-1829, 64, 115406 (2001). 10.1103/PhysRevB.64.115406
25. K. Hara, T. Tanii, and I. Ohdomari, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922, 38, 6860 (1999). 10.1143/JJAP.38.6860
26. T. Homma, C. P. Wade, and C. E. D. Chidsey, J. Phys. Chem. B JPCBFK 1089-5647, 102, 7919 (1998). 10.1021/jp982109n
27. K. Fukami, Y. Tanaka, M. L. Chourou, T. Sakka, and Y. H. Ogata, Electrochim. Acta ELCAAV 0013-4686, 54, 2197 (2009). 10.1016/j.electacta.2008. 10.024
28. K. L. Jarvis, T. J. Barnes, and C. A. Prestidge, Langmuir LANGD5 0743-7463, 24, 14222 (2008) 10.1021/la802316p; D. B. Mawhinney, J. A. Glass, and J. T. Yates, J. Phys. Chem. B JPCBFK 1089-5647, 101, 1202 (1997). 10.1021/jp963322r
29. S. Brunauer, P. H. Emmett, and E. Teller, J. Am. Chem. Soc. JACSAT 0002-7863, 60, 309 (1938). 10.1021/ja01269a023
30. P. O'Keeffe, Y. Aoyagi, S. Komuro, T. Kato, and T. Morikawa, Appl. Phys. Lett. APPLAB 0003-6951, 66, 836 (1995). 10.1063/1.113438
31. Y. H. Ogata, N. Yoshimi, R. Yasuda, T. Tsuboi, T. Sakka, and A. Otsuki, J. Appl. Phys. JAPIAU 0021-8979, 90, 6487 (2001). 10.1063/1.1416862 (Pubitemid 34046826)
32. S. Ye, T. Ichihara, and K. Uosaki, J. Electrochem. Soc. JESOAN 0013-4651, 148, C421 (2001). 10.1149/1.1370964 (Pubitemid 33695953)
33. Y. H. Ogata, J. Sasano, J. Jorne, T. Tsuboi, F. A. Harraz, and T. Sakka, Phys. Status Solidi A PSSABA 0031-8965, 182, 71 (2000). 10.1002/1521- 396X(200011)182:1<71::AID-PSSA71>3.0.CO;2-O
34. J. Elliott, Phys. Rev. PHRVAO 0031-899X, 108, 1384 (1957). 10.1103/PhysRev.108.1384
35. D. Snoke, Science SCIEAS 0036-8075, 273, 1351 (1996). 10.1126/science.273.5280.1351
36. S. LeinΒ, T. Kampfrath, K. v. Volkmann, M. Wolf, J. T. Steiner, M. Kira, S. W. Koch, A. Leitenstorfer, and R. Huber, Phys. Rev. Lett. PRLTAO 0031-9007, 101, 246401 (2008). 10.1103/PhysRevLett.101.246401
37. D. Fröhlich, A. Kulik, B. Uebbing, and A. Mysyrovicz, Phys. Rev. Lett. PRLTAO 0031-9007, 67, 2343 (1991). 10.1103/PhysRevLett.67.2343
38. K. BorgohaN. Murase, and S. Mahamuni, J. Appl. Phys. JAPIAU 0021-8979, 92, 1292 (2002). 10.1063/1.1491020 (Pubitemid 34924350)
39. L. Gou and C. J. Murphy, Nano Lett. NALEFD 1530-6984, 3, 231 (2003). 10.1021/nl0258776 (Pubitemid 37130542)
40. E. Ko, J. Choi, K. Okamoto, Y. Tak, and J. Lee, ChemPhysChem CPCHFT 1439-4235, 7, 1505 (2006). 10.1002/cphc.200600060
41. G. CeleE. CottancJ. Lerḿ, M. PellarL. Arnaud, J. R. Huntzinger, J. L. Vialle, M. Broyer, B. Palpant, O. Boisron, and P. Ḿlinon, Phys. Rev. B PRBMDO 0163-1829, 70, 165409 (2004). 10.1103/PhysRevB.70.165409 (Pubitemid 40100501)
42. P. Huber, D. Wallacher, and K. Knorr, J. Low Temp. Phys. JLTPAC 0022-2291, 111, 419 (1998) 10.1023/A:1022204223818; A. Henschel, T. Hofmann, P. Huber, and K. Knorr, Phys. Rev. E PLEEE8 1063-651X, 75, 021607 (2007) 10.1103/PhysRevE.75.021607; A. Henschel, P. Kumar, T. Hofmann, K. Knorr, and P. Huber, Phys. Rev. E PLEEE8 1063-651X, 79, 032601 (2009). 10.1103/PhysRevE.79. 032601