pH and iodide ion effect on corrosion inhibition of histidine self-assembled monolayer on copper

Thin Solid Films

Volumn 518, Issue 10, 2010, Pages 2745-2749

  Zhang, Da Quan ^a,b   He, Xian Ming ^b   Cai, Qi Rui ^b   Gao, Li Xin ^a   Kim, Gui Soon ^c  

^a SHANGHAI UNIVERSITY OF ELECTRIC POWER   (China)

^b SHANGHAI UNIVERSITY   (China)

^c University of Seoul   (South Korea)

Author keywords

Acid inhibition; Copper; Corrosion; Electrochemical impedance spectroscopy; Histidine; Polarization; Self assembled monolayers

Indexed keywords

ACID INHIBITION; AQUEOUS SOLUTIONS; COPPER SURFACE; CORROSION INHIBITION; INHIBITION MECHANISMS; IODIDE ION; PH VALUE; POLARIZATION TECHNIQUES; PROTECTION EFFICIENCY; QUANTUM CHEMICAL CALCULATIONS; SELF-ASSEMBLY SOLUTIONS; VARIOUS PH;

ACIDS; COPPER; COPPER CORROSION; CORROSION PREVENTION; CORROSION PROTECTION; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTRON ENERGY LEVELS; HYDROCHLORIC ACID; METAL ANALYSIS; ORGANIC POLYMERS; PHOSPHATASES; POLARIZATION; POTASSIUM IODIDE; QUANTUM CHEMISTRY; SELF ASSEMBLED MONOLAYERS;

PH EFFECTS;

EID: 76049102392     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.150     Document Type: Article

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