Low roughness laser etching of fused silica using an adsorbed layer

Applied Surface Science

Volumn 239, Issue 1, 2004, Pages 109-116

  Bohme R ^a   Zimmer, K ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Adsorbed layer; Excimer laser; Laser etching; Low roughness

Indexed keywords

ADSORPTION; EXCIMER LASERS; FUSED SILICA; LASER ABLATION; MICROSTRUCTURE; PHOTOLITHOGRAPHY; SURFACE ROUGHNESS; THERMAL EFFECTS;

ADSORBED LAYERS; LASER ETCHING; LOW ROUGHNESS; TRANSPARENT MATERIALS;

ETCHING;

EID: 7544243761     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.095     Document Type: Article

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