Layer-by-layer etching of Cl-adsorbed silicon surfaces by low energy Ar + ion irradiation

Applied Surface Science

Volumn 187, Issue 1-2, 2002, Pages 124-129

  Kim, Bum Jun ^a   Chung, Saehoon ^a   Cho, Sung M ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Atomic layer etching; Chlorine adsorption; Helicon plasma; Layer by layer etching

Indexed keywords

ADSORPTION; ARGON; CHLORINE; ETCHING; HELICONS; IRRADIATION; MONOLAYERS; PARTIAL PRESSURE; SPUTTERING; SURFACE ROUGHNESS;

ATOMIC LAYER ETCHING;

SURFACE REACTIONS;

EID: 0037075241     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00826-1     Document Type: Article

References (11)