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Applied Physics A: Materials Science and Processing

Volumn 68, Issue 3, 1999, Pages 369-371

Precision laser ablation of dielectrics in the 10-fs regime

(4) Lenzner, M a Kruger J b Kautek, W b Krausz, F a

a VIENNA UNIVERSITY OF TECHNOLOGY (Austria)

b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; FUSED SILICA; LASER ABLATION; LASER PULSES; MICROMACHINING; MORPHOLOGY; PULSED LASER APPLICATIONS; SURFACE ROUGHNESS; ULTRAFAST PHENOMENA;

LASER MICROMACHINING;

DIELECTRIC MATERIALS;

EID: 0033100822 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050906 Document Type: Article

Times cited : (122)

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