Oxide via etching in a magnetically enhanced CHF3/CF4/Ar plasma

Solid-State Electronics

Volumn 47, Issue 10, 2003, Pages 1799-1803

  Kim, Byungwhan ^a   Kwon, Sung Ku ^b  

^a Sejong University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Etching; Optical emission spectroscopy; Oxide; Polymer deposition

Indexed keywords

ETCHING; ION BOMBARDMENT; POLYMERS;

OXIDE FILMS;

OXIDES;

EID: 0041591272     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(03)00155-2     Document Type: Conference Paper

References (11)

1. Kim B., May G.S. IEEE Trans. Comp. Pack. Manufact. Technol. 19(1):1996;3-8.
2. Horiike Y., Kubota K., Fukasawa T. J. Vac. Sci. Technol. A. 13(3):1995;801-809.
3. Westerheim A.C., Labun A.H., Dubash J.H., Arnold J.C., Sawin H.H., Yu-Wang V. J. Vac. Sci. Technol. A. 13(3):1995;853-858.
4. Rueger N.R., Doemling M.F., Schaepkens M., Beulens J.J., Standaert T.E.F.M., Oehrlein G.G. J. Vac. Sci. Technol. A. 17(5):1999;2492-2502.
5. Kim B., Kwon K.H., Kwon S.K., Park J.M., Yoo W.W., Park K.S.et al. J. Vac. Sci. Technol. B. 20(5):2002;2113.
6. Rueger N.R., Beulens J.J., Schaepkens M., Doemling M.F., Miraz J.M., Standaert T.E.F.M.et al. J. Vac. Sci. Technol. A. 15:1997;1881.
7. Sowa M.J., Littau M.E., Pohray V., Cecchi J.L. J. Vac. Sci. Technol. A. 18:2002;2122.
8. Perry W.L., Waters K., Barola M., Anderson H.M. J. Vac. Sci. Technol. A. 19:2001;2272.
9. Kim B., Lee B.T. IEEE Trans. Plasma Sci. 30:2002;2074.
10. Kim J.H., Kang C.J., Ahn T.H., Moon J.T. Thin Solid Films. 345:1999;124.
11. Samukawa S. Appl. Phys. Lett. 68:1996;316.