메뉴 건너뛰기




Volumn 13, Issue 3, 2010, Pages

AZO-gated Al0.2 Ga0.8 As/ In0.2 Ga 0.8 as high electron mobility transistors

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; GATE DRAIN; GATED DEVICES; HIGH TRANSMITTANCE; HIGH TRANSPARENCY; OPTICAL SENSING; VOLTAGE GAIN;

EID: 74849116020     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3272929     Document Type: Article
Times cited : (5)

References (13)
  • 3
    • 79956003382 scopus 로고    scopus 로고
    • A study of subbands in AlGaN/GaN high-electron-mobility transistor structures using low-temperature photoluminescence spectroscopy
    • DOI 10.1063/1.1485310
    • C. Y. Fang, C. F. Lin, E. Y. Chang, and M. S. Feng, Appl. Phys. Lett., 80, 4558 (2002). 10.1063/1.1485310 (Pubitemid 34751405)
    • (2002) Applied Physics Letters , vol.80 , Issue.24 , pp. 4558
    • Fang, C.Y.1    Lin, C.F.2    Chang, E.Y.3    Feng, M.S.4
  • 7
    • 24144501095 scopus 로고    scopus 로고
    • Effect of surface treatment on electrical properties of AlGaAs/GaAs heterojunction bipolar transistor
    • DOI 10.1016/j.sse.2005.06.014, PII S0038110105001759
    • C. H. Baek, T. K. Oh, and B. K. Kang, Solid-State Electron., 49, 1335 (2005). 10.1016/j.sse.2005.06.014 (Pubitemid 41230836)
    • (2005) Solid-State Electronics , vol.49 , Issue.8 , pp. 1335-1340
    • Baek, C.H.1    Oh, T.K.2    Kang, B.K.3
  • 9
    • 37149023807 scopus 로고    scopus 로고
    • Relieved kink effects in symmetrically graded In0.45 Al0.55 As Inx Ga1-x As metamorphic high-electron-mobility transistors
    • DOI 10.1063/1.2817958
    • C. S. Lee, and C. H. Liao, J. Appl. Phys., 102, 114502 (2007). 10.1063/1.2817958 (Pubitemid 350262155)
    • (2007) Journal of Applied Physics , vol.102 , Issue.11 , pp. 114502
    • Lee, C.-S.1    Liao, C.-H.2
  • 13
    • 33747345916 scopus 로고    scopus 로고
    • Experimental evidence for dislocation-related gettering in metamorphic InP/InGaAs high electron mobility transistor (HEMT) structures on GaAs substrate
    • DOI 10.1063/1.2222004
    • Y. Liu and H. Wang, J. Appl. Phys., 100, 034505 (2006). 10.1063/1.2222004 (Pubitemid 44244756)
    • (2006) Journal of Applied Physics , vol.100 , Issue.3 , pp. 034505
    • Liu, Y.1    Wang, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.