On-line monitoring of residual solvent during the pharmaceutical drying process using non-contact infrared sensor: A process analytical technology (PAT) approach

Sensors and Actuators, B: Chemical

Volumn 144, Issue 1, 2010, Pages 104-111

  Tewari, Jagdish ^a   Dixit, Vivechana ^b   Malik, Kamal ^c  

^a Cornell University ^*  (United States)

^b School of Operations Research and Industrial Engineering   (United States)

^c Mount Olive College   (United States)

Author keywords

CVA; Non contact IR sensor; PAT; PCA; PLS

Indexed keywords

AGGLOMERATIVE HIERARCHICAL CLUSTERING; CANONICAL VARIATE ANALYSIS; CHEMOMETRIC MODELS; CHEMOMETRICES; CLASSIFICATION ACCURACY; DEGREE OF PRECISION; DRYING PROCESS; END POINTS; INFRA-RED SENSOR; IR SENSOR; NON-CONTACT; NON-CONTACT SENSORS; ONLINE MONITORING; PARTIAL LEAST SQUARES; PROCESS ANALYTICAL TECHNOLOGY; RESIDUAL SOLVENTS; SOLVENT DRYING; SOLVENT VAPORS; THREE STAGES; VAPOR PHASE;

CURING; DEWATERING; DRUG PRODUCTS; INFRARED DETECTORS; MONITORING; OPTICAL SENSORS; PRINCIPAL COMPONENT ANALYSIS; SEMICONDUCTOR QUANTUM DOTS; SOLVENTS; VAPORS;

INFRARED DRYING;

EID: 74149094436     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2009.10.039     Document Type: Article

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