High-speed deposition of dense, dendritic and porous SiO2 films by Nd: YAG laser chemical vapor deposition

Materials Science and Engineering: B

Volumn 166, Issue 3, 2010, Pages 225-229

  Endo, Jun ^a   Ito, Akihiko ^a   Kimura, Teiichi ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Coating; Laser CVD; Microstructure; Silica

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; NEODYMIUM LASERS; SILICA; YTTRIUM ALUMINUM GARNET;

CONTINUOUS WAVE MODES; DENDRITICS; FLAME FORMATION; HIGH POWER; HIGH SPEED DEPOSITION; LASER CHEMICAL VAPOR DEPOSITION; LASER CVD; LASER POWER; ND:YAG LASER; TETRAETHYL ORTHOSILICATES;

MICROSTRUCTURE;

EID: 74149085718     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2009.12.047     Document Type: Article

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