"sensArray" voltage sensor analysis in an inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 1, 2010, Pages 139-146

  Titus, M J ^a   Hsu, C C ^a,b   Graves, D B ^a  

^a University of California   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMAS; INDUCTIVELY COUPLED PLASMA REACTOR; MATERIALS PROCESSING; NEW YORK; PLASMA CONDITIONS; PLASMA DISCHARGE; PLASMA-SHEATH INTERFACE; RF BIAS; SCALING BEHAVIOR; SENSOR MEASUREMENTS; SIMULATION DEMONSTRATE; SQUARE ROOTS; VALIDATE SENSORS; VOLTAGE SENSOR;

BIAS VOLTAGE; INDUCTIVELY COUPLED PLASMA; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA JETS; PLASMA SHEATHS; SCALING LAWS; SENSORS;

ELECTRIC DISCHARGES;

EID: 73849146418     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3268615     Document Type: Article

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