Wafer-grown heat flux sensor arrays for plasma etch processes

IEEE Transactions on Semiconductor Manufacturing

Volumn 18, Issue 1, 2005, Pages 148-162

  Freed, Mason ^a   Krüger, Michiel V P ^a   Poolla, Kameshwar ^b   Spanos, Costas J ^c  

^a OnWafer Technologies   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Heat flux; Plasma etching; Semiconductor manufacturing; Sensors

Indexed keywords

HEAT FLUX; MICROELECTROMECHANICAL DEVICES; PLASMA ETCHING; RAPID THERMAL ANNEALING; REACTIVE ION ETCHING; SEMICONDUCTOR MATERIALS; X RAYS;

RAPID THERMAL PROCESS (RTP); SEMICONDUCTOR MANUFACTURING; WAFERS; X-RAY MASK PROCESSING;

SENSORS;

EID: 13844281156     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.840526     Document Type: Article

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