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Review of Scientific Instruments

Volumn 80, Issue 12, 2009, Pages

Flexible CO2 laser system for fundamental research related to an extreme ultraviolet lithography source

(7) Tao, Y a Tillack, M S a Amin, N a,b Burdt, R A a Yuspeh, S a Shaikh, N M a,c Najmabadi, F a

a UNIVERSITY OF CALIFORNIA SAN DIEGO (United States)

b UNIVERSITY OF AGRICULTURE (Pakistan)

c UNIVERSITY OF SINDH (Pakistan)

Author keywords

[No Author keywords available]

Indexed keywords

13.5 NM; A-TRAIN; DIFFRACTION LIMITS; ELECTRONIC SYNCHRONIZATION; EUV EMISSIONS; FUNDAMENTAL RESEARCH; HIGH CONVERSION EFFICIENCY; IN-BAND; LASER INTENSITIES; LASER PULSE DURATION; LASER SYSTEMS; MAIN AMPLIFIERS; MASTER OSCILLATORS; MOPA LASER SYSTEM; OSCILLATOR MODES; PEAK POWER; PLASMA SWITCHES; PULSE DURATIONS; TARGET SURFACE;

CONVERSION EFFICIENCY; LASER PULSES; OSCILLATORS (ELECTRONIC); PHOTOLITHOGRAPHY; POWER AMPLIFIERS; ULTRAVIOLET DEVICES; ULTRAVIOLET LASERS;

PULSED LASER APPLICATIONS;

EID: 73849099683 PISSN: 00346748 EISSN: None Source Type: Journal
DOI: 10.1063/1.3270257 Document Type: Article

Times cited : (8)

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