High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets

Optics Express

Volumn 16, Issue 2, 2008, Pages 965-974

  Hou, Kai Chung ^a   George, Simi ^b   Mordovanakis, Aghapi G ^a   Takenoshita, Kazutoshi ^b   Nees, John ^a   Lafontaine, Bruno ^c   Richardson, Martin ^b   Galvanauskas, Aimantas ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

^c ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DROPS; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PULSES; RADIATION; WATER;

LASER-PLASMA TARGET; OPTICAL WAVEFORM GENERATION; WATER DROPLET;

FIBER LASERS;

TIN; WATER; YTTERBIUM;

ARTICLE; CHEMISTRY; FIBER OPTICS; INSTRUMENTATION; LASER; METHODOLOGY; PHOTOGRAPHY;

FIBER OPTICS; LASERS; PHOTOGRAPHY; TIN; WATER; YTTERBIUM;

EID: 38549103102     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.000965     Document Type: Article

References (23)

1. E. A. Gibson et al, "Coherent Soft X-ray Generation in the Water Window with Quasi-Phase Matching," Science 302, 95-98 (2003)
2. D. Attwood, Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications, (Cambridge University Press, Berkeley, 2000)
3. R. H. Stulen, "13-nm Extereme Ultraviolet Lithography," J. Sel. Top. Quantum Electron. 1, 970-975 (1995)
4. C-S. Koay, S. George, K. Takenoshita, et al, "High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL," Proc. of SPIE 5751, 279-292 (2005)
5. D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O.Vaschenko, O. V. Khodykin, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, C. P. Chrobak, "LPP EUV Source Development for HVM," Proc. of SPIE 6517, 65173J-1 (2007).
6. A. G. Mordovanakis, K. -C. Hou, Y. -C. Chang, M. -Y. Cheng, J. Nees, B. Hou, A. Maksimchuk, G. Mourou, A. Galvanauskas, and B. Lafontaine, "Demonstration of fiber-laser-produced plasma source and application to efficient extreme UV light generation," Opt. Lett. 31, 2517-2519 (2006)
7. S. A. George, W. T. Silfvast, K. Takenoshita, R. T. Bernath, C. -S. Koay, G. Shimkaveg, and M. C. Richardson, "Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas," Opt. Lett. 32, 997-999 (2007)
8. R. C. Spitzer, T. J. Orzechowski, D. W. Phillion, R. L. Kauffman, and C. Cerjan, "Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime," J. Appl. Phys. 79, 2251-2258 (1996)
9. P. A. C. Jansson, B. A. M. Hansson, O. Heinberg, M. Otendal, A. Holmberg, J. de Groot, and H. M. Hertz, "Liquid-tin-jet laser-plasma extreme ultraviolet generation," Appl. Phys. Lett. 84, 2256-2258 (2004)
10. 2 and Nd:YAG laser-produced tin plasmas," Appl. Phys. Lett. 87, 041503 (2005)
11. T. Ando, S. Fujioka, H. Nishimura, N. Ueda, Y. Yasuda, K. Nagai, T. Norimatsu, M. Murakami, K. Nishihara, N. Miyanaga, Y. Izawa, K. Mima, and A. Sunahara, "Optimum laser pulse duration for efficient extreme ultraviolet light generation from laser-produced tin plasmas," Appl. Phys. Lett. 89, 151501(2006)
12. T. Okuno, S. Fujioka, a H. Nishimura, Y. Tao, K. Nagai, Q. Gu, N. Ueda, T. Ando, K. Nishihara, T. Norimatsu, N. Miyanaga, Y. Izawa, and K. Mima, A. Sunahara, H. Furukawa and A. Sasaki, "Low-density tin targets for efficient extreme ultraviolet light emission from laser-produced plasmas," Appl. Phys. Lett. 88, 161501 (2006)
13. Y. Tao, S. S. Harilal, M. S. Tillack, K. L. Sequoia, B. O'Shay, and F. Najmabadi, "Effect of focal spot size on in-band 13.5 nm extreme ultraviolet emission from laser-produced Sn plasma," Opt. Lett. 31, 2492-2494 (2006)
14. K.-C. Hou et al, "Multi-MW Peak Power Scaling of Single-Transverse Mode Pulses using 80-μm Core Yb-doped LMA Fibers," presented in Post Deadline Paper session at Advanced Solid-State Photonics (Optical Society of America, 2006)
15. C. C. Renaud, H. L. Offerhaus, J. A. Alvarez-Chavez, J. Nilsson, W. A. Clarkson, P. W. Turner, D. J. Richardson, and A. B. Grudinin, "Characteristics of Q-Switched Cladding-Pumped Ytterbium-Doped Fiber Lasers with Different High-Energy Fiber Designs," IEEE J.Quantum Electron. 37, 199-206 (200.1).
16. A. E. Siegman, Laser, (Unversity Science Books, Sausalito, CA, 1986), Chap. 10.
17. S. Webster, F.C. McDonald, A. Villanger, M.J. Soileau, E.W. Van Stryland, D.J. Hagan, B. McIntosh, W. Torruellas, J. Farroni, and K. Tankala, "Optical damage measurements for high peak power ytterbium doped fiber amplifiers," Proc. SPIE 5991, 599115 (2005).
18. A. Galvanauskas, M.-Y. Cheng, K.-C. Hou, and K.-H. Liao, "High Peak Power Pulse Amplification in Large-Core Yb-Doped Fiber Amplifiers," IEEE J. Sel. Top. Quantum Eletron. 13, 559-566 (2007)
19. A. Galvanauskas, "Mode-scalable fiber-based chirped pulse amplification systems," IEEE J. Sel. Top. Quantum Electron. 7, 504-517 (2001).
20. K. T. Vu, A. Malinowski, D. J. Richardson, F. Ghiringhelli, L. M. B. Hickey, and M. N. Zervas, "Adaptive pulse shape control in a diode-seeded nanosecond fiber MOPA system," Opt. Exp. 14, 10996-11001, 2006
21. S. Usterer,H. Schwoerer, W. Ziegler, D. Salzmann, and R. Sauerbrey, "Effects of a prepulse on laser-induced EUV radiation conversion efficiency," Appl. Phys. B 76, 17-21 (2003)
22. P. Dunne, G. O'Sullivan, and D. O'Reilly, "Prepulse-enhanced narrow bandwidth soft x-ray emission from a low debris, subnanosecond, laser plasma source," Appl. Phys. Lett. 76, 34-36 (2000)
23. F. Jin, K. Gabel, M. Richardson, M. Kado, A. F. Vasil'ev & D. Salzmann, "Mass limited laser plasma cryogenic target for 13 nm point x-ray sources for lithography," Proc. SPIE 2015, 151-159 (1993)