Optical and structural investigation of Si nanoclusters in amorphous hydrogenated silicon

Thin Solid Films

Volumn 518, Issue 6 SUPPL. 1, 2010, Pages

  Shcherbyna, Ye S ^a   Torchynska, T V ^b  

^a NATIONAL TECHNICAL UNIVERSITY OF UKRAINE   (Ukraine)

^b INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

Amorphous silicon nanoclusters; HW CVD; Photoluminescence; Silicon nanocrystals; XRD

Indexed keywords

AMORPHOUS SI; AMORPHOUS SILICON NANOCLUSTERS; DIFFERENT SIZES; FLOW RATIOS; GAS SOURCES; GLASS SUBSTRATES; HOT WIRE CVD; HYDROGENATED SILICON; JOINT ANALYSIS; MIXTURE FLOW; OPTICAL PARAMETER; OXYGEN FLOW; PHASE VOLUME; SI NANOCLUSTER; SI NANOCRYSTAL; SILICON NANOCRYSTALS; STRUCTURAL INVESTIGATION; TECHNOLOGICAL CONDITIONS; X-RAY DIFFRACTION INVESTIGATIONS; XRD;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DIFFRACTION; HYDROGENATION; NANOCLUSTERS; NANOCRYSTALS; OPTICAL CORRELATION; OXYGEN; PHOTOLUMINESCENCE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SILICON;

EID: 73649096217     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.089     Document Type: Article

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