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Volumn 234, Issue 1-4, 2004, Pages 268-273
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Nanostructural features of nc-Si:H thin films prepared by PECVD
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Author keywords
Nanocrystallite; PECVD; Photoluminescence; Si; Thin film
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Indexed keywords
AMORPHOUS MATERIALS;
ANNEALING;
CHEMICAL BONDS;
HYDROGEN BONDS;
LIQUID CRYSTAL DISPLAYS;
NANOSTRUCTURED MATERIALS;
OPTOELECTRONIC DEVICES;
PHOTOLUMINESCENCE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
THIN FILMS;
BAND-GAP BROADENING;
EVACUATED REACTION CHAMBER;
OPTICAL EMISSION;
SURFACE PASSIVATION;
SILICON COMPOUNDS;
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EID: 3342955631
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2004.05.073 Document Type: Conference Paper |
Times cited : (45)
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References (18)
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