Improved dielectric and ferroelectric properties in Ti-doped BiFeO3-PbTiO3 thin films prepared by pulsed laser deposition

Thin Solid Films

Volumn 518, Issue 6, 2010, Pages 1637-1640

  Chen, Ling ^a,b   Ren, Wei ^a   Zhu, Weimin ^b   Ye, Zuo Guang ^a,b   Shi, Peng ^a   Chen, Xiaofeng ^a   Wu, Xiaoqing ^a   Yao, Xi ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Dielectric properties; Ferroelectric properties; Ionic substitution; Multiferroics; Pulsed laser deposition; Scanning electron microscopy; Thin films; X ray diffraction

Indexed keywords

ALIOVALENTS; DIELECTRIC AND FERROELECTRIC PROPERTIES; FERROELECTRIC PROPERTY; IONIC SUBSTITUTIONS; MULTIFERROICS; REMNANT POLARIZATIONS; SWITCHABLE POLARIZATION; TETRAGONAL STRUCTURE;

DEPOSITION; DIFFRACTION; FERROELECTRIC FILMS; FERROELECTRICITY; POLARIZATION; PULSED LASER DEPOSITION; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; THIN FILM DEVICES; THIN FILMS; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 73449107490     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.11.072     Document Type: Article

References (21)

1. Ramesh R., and Spaldin N.A. Nat. Matters 6 (2007) 21
2. Luo W.B., Zhu J., Li Y.R., Wang X.P., Zhao D., Xiong J., and Zhang Y. Appl. Phys. Lett. 91 (2007) 082501
3. Yakovlev S., Zekonyte J., Solterbeck C.-H., and Es-Souni M. Thin Solid Films 493 (2005) 24
4. Simões A.Z., Cavalcante L.S., Riccardi C.S., Varela J.A., and Longo E. J. Sol-Gel Sci. Technol. 44 (2007) 269
5. Zheng R.Y., Sim C.H., and Wang J. J. Am. Ceram. Soc. 91 (2008) 3240
6. Sosnowska I., Peterlin-Neumaier T., and Steichele E. J. Phys. C. Solid State Phys. 15 (1982) 4835
7. Blaauw C., and van der Woude F. J. Phys. C. Solid State Phys. 6 (1973) 1422
8. Fischer P., Połomska M., Sosnowska I., and Szymański M. J. Phys. C. Solid State Phys. 13 (1980) 1931
9. Yun K.Y., Noda M., and Okuyama M. Appl. Phys. Lett. 83 (2003) 193981
10. Chu Y.H., Zhan Q., Yang C.-H., Cruz M.P., Martin L.W., Zhao T., Yu P., Ramesh R., Joseph P.T., Lin I.N., Tian W., and Schlom D.G. Appl. Phys. Lett. 92 (2008) 102909
11. Smith R.T., Achenbach G.D., Gerson R., and James W.J. J. Appl. Phys. 39 (1968) 70
12. Zhu W.M., Guo H.Y., and Ye Z.G. Phys. Rev. B 78 (2008) 014401
13. Khan M.A., Comyn T.P., and Bell A.J. Appl. Phys. Lett. 91 (2007) 032901
14. Zhu W.M., and Ye Z.G. Appl. Phys. Lett. 89 (2006) 232904
15. Sunder V.S., Halliyal A., and Umarji A.M. J. Mater. Res. 10 (1995) 1301
16. Zhu W.M., and Ye Z.G. Ceram. Int. 30 (2004) 1435
17. Cheng J.R., Meng Z.Y., and Cross L.E. J. Appl. Phys. 98 (2005) 084102
18. Simmons J.G. DC Conduction in Thin Films (1971), Mills & Boon Limited, London
19. Qi X.D., Dho J., Tomov R., Blamire M.G., and MacManus-Driscoll J.L. Appl. Phys. Lett. 86 (2005) 062903
20. Clark S.J., and Robertson J. Appl. Phys. Lett. 94 (2009) 022902
21. Zhou Y., Chan H.K., Lam C.H., and Shin F.G. J. Appl. Phys. 98 (2005) 024111