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Journal of Electroceramics
Volumn 23, Issue 2-4, 2009, Pages 468-473
Effect of heat treatment of sputter deposited ZnO films co-doped with H and Al
Author keywords

Annealing; Hydrogen doping; Magnetron sputtering; Transparent conducting oxide; ZnO
Indexed keywords

ABSORPTION COEFFICIENTS; ABSORPTION LOSS; AIR AMBIENT; AL CONTENT; AL-DOPED ZNO; ANNEALED FILMS; AS-DEPOSITED FILMS; AS-GROWN FILMS; CO-DOPED; CORNING GLASS; CRYSTALLINITIES; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; FIGURE OF MERIT; FREE CARRIERS; HYDROGEN ADDITION; HYDROGEN DOPANT; HYDROGEN DOPING; SPUTTER GAS; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTING OXIDE; VACUUM-ANNEALING; ZNO; ZNO FILMS;
EID: 73449090153     PISSN: 13853449     EISSN: 15738663     Source Type: Journal    
DOI: 10.1007/s10832-008-9497-z     Document Type: Article
Times cited : (11)
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