New transparent conducting ZnO-In2O3-SnO2 thin films prepared by magnetron sputtering

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 318-321

  Minami, T ^a   Kakumu, T ^a   Shimokawa, K ^a   Takata, S ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Magnetron sputtering; Oxide; Thin films

Indexed keywords

CONDUCTIVE FILMS; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; OXIDES; TRANSPARENCY;

MULTICOMPONENT OXIDE; RADIO FREQUENCY PLANAR MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0032048970     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00547-6     Document Type: Article

References (12)

1. H.L. Hartnagel, A.L. Dawar, A.K. Jain, C. Jagadish, Semiconducting Transparent Thin Films, IOP Publishing, 1995.
2. T. Minami, S. Takata, T. Kakumu, H. Sonohara, Thin Solid Films 270 (1995) 22.
3. T. Minami, T. Kakumu, S. Takata, J. Vac. Sci. Technol. A14 (1996) 1704.
4. T. Minami, T. Kakumu, S. Takata, J. Vac. Sci. Technol. A14 (1996) 1689.
5. H. Enoki, T. Nakayama, J. Echigoya, Phys. Status Solidi A 129 (1992) 181.
6. H. Un'no, N. Hikuma, T. Omata, N. Ueda, T. Hashimoto, K. Yanagawa, Y. Ohki, T. Omata, H. Hosono, N. Ueda, H. Kawazoe, Jpn. J. Appl. Phys. 32 (1993) L1693.
7. T. Minami, H. Sonohara, S. Takata, H. Sato, Jpn. J. Appl. Phys. 33 (1994) L1693.
8. J.M. Philips, J. Kwo, G.A. Thomas, S.A. Carter, R.J. Cava, S.Y. Hou, J.J. Krajewski, J.H. Marshall, W.F. Peck, D.H. Rapkine, R.B. van Dover, Appl. Phys. Lett. 65 (1994) 115.
9. K. Yanagawa, Y. Ohki, T. Omata, H. Hosono, N. Ueda, H. Kawazoe, Appl. Phys. Lett. 65 (1994) 406.
10. T. Minami, H. Sonohara, T. Kakumu, S. Takata, Jpn. J. Appl. Phys. 34 (1995) L971.
11. T. Minami, S. Takata, H. Sato, H. Sonohara, J. Vac. Sci. Technol. A13 (1995) 1095.
12. H. Enoki, J. Echigoya, Phys. Status Solidi A A13 (1992) K1.