Design of multi-wavelength micro raman spectroscopy system and its semiconductor stress depth profiling applications

Applied Physics Express

Volumn 2, Issue 11, 2009, Pages

  Yoo, Woo Sik ^a   Kang, Kitaek ^a   Ueda, Takeshi ^a   Ishigaki, Toshikazu ^a  

^a WaferMasters Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AREA MAPS; CRYSTALLINITIES; DESIGN CONCEPT; EXCITATION WAVELENGTH; MEMORY DEVICE; MICRO RAMAN SPECTROSCOPY; MULTIWAVELENGTH; NON-CONTACT; NONDESTRUCTIVE CHARACTERIZATION; PENETRATION DEPTH; PROFILING APPLICATION; RAMAN SHIFT; RAMAN SIGNAL; SCATTERING PROBABILITIES; STRESS DEPTH;

DEPTH PROFILING; RAMAN SCATTERING; SEMICONDUCTOR MATERIALS;

RAMAN SPECTROSCOPY;

EID: 73249115961     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.116502     Document Type: Article

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