E-beam exposure system using multi column cell (MCC) with CP for mask writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Yamada, Akio ^a   Yasuda, Hiroshi ^a   Yamabe, Masaki ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Character projection; Electron beam exposure system; Mask writing; Multi column cell

Indexed keywords

BEAM POSITIONS; CHARACTER PROJECTION; ELECTRON BEAM EXPOSURE SYSTEM; EXPOSURE SYSTEMS; MASK WRITING; MULTI COLUMN CELL; PROOF OF CONCEPTS; VSB ( VARIABLE SHAPED BEAM);

BAR CODES; CELLS; ELECTRON BEAMS; ELECTRONS;

ELECTRON BEAM LITHOGRAPHY;

EID: 62749143584     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801564     Document Type: Conference Paper

References (3)

1. M. Yamabe, "Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction", Proc. SPE 7028, 70280V (2008)
2. H.Yasuda, A.Yamada, and M.Yamabe, "Multi Column Cell (MCC) E-beam Exposure System for Mask Writing", Proc. SPE 7028, 70280B (2008)
3. A. Yamada, H. Yasuda, and M. Yamabe, "Electron beams in individual column cells of multicolumn cell system", To be published in " J. Vac. Sci. Technol. B 26, Nov/Dec (2008) "