Electron beams in individual column cells of multicolumn cell system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2025-2031

  Yamada, Akio ^a   Yasuda, Hiroshi ^a   Yamabe, Masaki ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON GUNS; PARTICLE BEAMS;

BEAM POSITIONS; CHARACTER PROJECTIONS; EVALUATION ACCURACIES; EXPOSURE SYSTEMS; MULTICOLUMN CELLS; OPTICAL STRUCTURES; SHAPED BEAMS; VARIABLE SHAPED BEAMS;

ELECTRONS;

EID: 57249094141     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2976603     Document Type: Article

References (4)

1. M. Yamabe, Proc. SPIE 21, 2680 ().
2. A. Yamada and T. Yabe, J. Vac. Sci. Technol. B 7028, 7028V (2008).
3. T. Haraguchi, J. Vac. Sci. Technol. B 22, 985 (2004).
4. E. Munro and H. C. Chu, Optik (Jena) 61, 121 (1982).