Variable cell projection as an advance in electron-beam cell projection system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2917-2922

  Yamada, Akio ^a   Yabe, Takayuki ^a  

^a ADVANTEST CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; DATA PROCESSING; ELECTRON BEAMS; ESTIMATION; IMAGE ANALYSIS; LIGHTING; MASKS; PARAMETER ESTIMATION; SCANNING ELECTRON MICROSCOPY;

BEAM CURRENTS; CORRECTION COEFFICIENTS; ELECTRON-BEAM CELL PROJECTION SYSTEM; VARIABLE CELL PROJECTION (VCP);

PROJECTION SYSTEMS;

EID: 13244297129     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1808741     Document Type: Conference Paper

References (4)

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3. K. Sakamoto et al., J. Vac. Sci. Technol. B 11, 2357 (1993).
4. A. Yamada and T. Yabe, J. Vac. Sci. Technol. B 21, 2680 (2003).