Multi Column Cell (MCC) e-beam exposure system for mask writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Yasuda, Hiroshi ^a   Yamada, Akio ^a   Yamabe, Masaki ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Character projection; e beam mask writer; Multi column; Throughput

Indexed keywords

AEROSPACE APPLICATIONS; ARCHITECTURAL DESIGN; BAR CODES; COLUMNS (STRUCTURAL); COMPUTER NETWORKS; CONSTRUCTION EQUIPMENT; COSTS; FIBER OPTIC SENSORS; FINANCE; INDUSTRIAL RESEARCH; INSPECTION EQUIPMENT; OPTICAL ENGINEERING; PROJECTION SYSTEMS; RESEARCH LABORATORIES; TECHNOLOGY;

CHARACTER PROJECTION (CP); DEVELOPMENT PROGRAMS; EQUIPMENT TECHNOLOGIES; EXPOSURE SYSTEMS; INSPECTION TECHNOLOGY; MANUFACTURING COSTS; MASK DESIGNS; MASK TECHNOLOGY; MASK WRITING; MULTI COLUMN CELL (MCC); NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING; VSB ( VARIABLE SHAPED BEAM); WRITING SYSTEMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 45549092927     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793019     Document Type: Conference Paper

References (1)

1. Takeshi Haraguchi, Tomohiro Sakazaki, Takamasa Satoh, Mitsuhiro Nakano, Shin-ichi Hamaguchi, Talcashi Kiuchi, Hidefumi Yabara, and Hiroshi Yasuda, "Multicolumn cell: Evaluation of the proof of concept system", J. Vac. Sci. Technol. B 22, 985 - 988 (2004).