Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2668-2673

  Ebm, Christoph ^a   Platzgummer, Elmar ^a   Loeschner, Hans ^a   Eder Kapl, Stefan ^a   Joechl, Peter ^a   Kuemmel, Marco ^a   Reitinger, Ruediger ^a   Hobler, Gerhard ^b   Koeck, Anton ^c   Hainberger, Rainer ^c   Wellenzohn, Markus ^c   Letzkus, Florian ^d   Irmscher, Mathias ^d  

^a IMS NANOFABRICATION AG   (Austria)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^c AIT AUSTRIAN INSTITUTE OF TECHNOLOGY   (Austria)

^d Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN SILSESQUIOXANE; ION BEAM SYSTEM; MASK LESS; MULTI-BEAM; NANOPATTERNING; NONLOCAL; PHOTONIC APPLICATION; PHOTONIC DEVICE FABRICATION; PHOTONIC STRUCTURE; PROOF OF CONCEPT; REGULAR ARRAY; SIDEWALL ROUGHNESS; SIMULATION RESULT; SIMULATION SOFTWARE;

ETCHING; EXPERIMENTS; ION BEAMS; IONS; OPTICAL WAVEGUIDES;

COMPUTER SOFTWARE;

EID: 72849108109     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3242693     Document Type: Conference Paper

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