Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Platzgummer, Elmar ^a   Loeschner, Hans ^a   Gross, Gerhard ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

Ion multi beam exposure; Mask pattern generator; Nanopatterning; Programmable aperture plate system

Indexed keywords

ENGINEERING TOOLS; EUROPEAN PROJECTS; EXPOSURE DOSE; EXPOSURE TOOLS; MASK PATTERN GENERATOR; MASK-LESS PATTERNING; NANOPATTERNING; PROGRAMMABLE APERTURE PLATE SYSTEM; PROOF OF CONCEPTS; SPOT SIZES;

ELECTRON BEAM LITHOGRAPHY; EXPOSURE METERS; MASKS;

IONS;

EID: 62649166334     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801441     Document Type: Conference Paper

References (7)

1. Elmar Platzgummer, Hans Loeschner, and Gerhard Gross: "Projection Mask-Less Patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates", Proc. SPIE Vol. 6730 (2007).
2. th Framework Program (FP6); www. charpan. com
3. Elmar Platzgummer. Hans Loeschner, and Gerhard Gross, "Projection Mask-Less Patterning (PMLP) for Nanotechnology Applications", accepted for publication in J. Vac. Sci. Technol. B, Nov/Dec 2008.
4. IPhoS (Ion beam technology for Photonic Structures) as part of the cluster project PLATON (Processing Light-Advanced Technologies for Optical Nanostructures), funded by the Austrian Nano-Initiative: www.nanoinitiative.at
5. th European Framework Programme (FP7)
6. NILdirect-stamp project as part of the Nanolmprint Lithography cluster project "NILaustria", funded by the Austrian Nano-Initiative: www.nilaustria.at
7. Holger Sailer, Institute for Microelectronics Stuttgart, Germany, private communication. [8] Joerg Butschke, Mathias Irmscher, Holger Sailer, Lorenz Nedelmann, Hans Loeschner, and Elmar Platzgummer, "Mask patterning for the 22nm node using a proton multi-beam projection pattern generator", SPIE Photomask BACUS 2008, Monterey, California, USA, Oct 6-10, 2008.