Insight into precursor kinetics using an infrared gas analyser

Opto-Electronics Review

Volumn 18, Issue 1, 2010, Pages 95-101

  Klos K ^a   Piotrowski, A ^a   Gawron, W ^b   Piotrowski, J ^a  

^a VIGO SYSTEM S A   (Poland)

^b MILITARY UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

IR gas analyser; MOCVD

Indexed keywords

CADMIUM ALLOYS; LIGHT ABSORPTION; MERCURY AMALGAMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MULTILAYERS; QUANTUM CHEMISTRY; SEMICONDUCTOR ALLOYS;

GAS ANALYSER; GROWTH CONDITIONS; MODEL PARAMETERS; MULTILAYER PROCESS; MULTILAYER STRUCTURES; PERIODIC SWITCHING; TIME DEPENDENT; TRANSPORT CHARACTERISTICS;

GROWTH KINETICS;

EID: 72749110912     PISSN: 12303402     EISSN: 18963757     Source Type: Journal    
DOI: 10.2478/s11772-009-0025-8     Document Type: Article

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