A model of the interdiffused multilayer process

Journal of Electronic Materials

Volumn 25, Issue 9, 1996, Pages 1561-1569

  Svoronos, Spyros A ^a   Woo, Wilbur W ^a   Irvine, Stuart J C ^b   Sankur, Haluk O ^c   Bajaj, Jagmohan ^c  

^a University of Florida   (United States)

^b GLYNDWR UNIVERSITY   (United Kingdom)

^c Rockwell International   (United States)

Author keywords

HgCdTe; In situ monitoring; Interdiffused multilayer process; Laser reflectance; MOCVD; Modeling

Indexed keywords

EID: 0343216337     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02655400     Document Type: Article

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