Prediction of etching rate of alumino-silicate glass by RSM and ANN

Journal of Scientific and Industrial Research

Volumn 68, Issue 11, 2009, Pages 920-924

  Ting, H T ^a   Abou El hossein, K A ^b   Chua, H B ^a  

^a CURTIN UNIVERSITY   (Australia)

^b NELSON MANDELA METROPOLITAN UNIVERSITY   (South Africa)

Author keywords

Alumino silicate glass; ANN; Etching rate; RSM

Indexed keywords

BACKPROPAGATION; ETCHING; GLASS; NEURAL NETWORKS; REGRESSION ANALYSIS; SILICATES;

ARTIFICIAL NEURAL NETWORK; CHEMICAL-ETCHING PROCESS; DATA VALUES; ETCHING PERIODS; ETCHING RATE; FACTORIAL DESIGN; INPUT PARAMETER; MATERIAL REMOVAL RATE; NEW MODEL; PROCESS PARAMETERS; QUADRATIC MODELS; RESPONSE SURFACE METHODOLOGY;

ANALYSIS OF VARIANCE (ANOVA);

ANALYTICAL METHOD; ARTIFICIAL NEURAL NETWORK; CONDENSATION; ETCHING; EXPERIMENTAL STUDY; GLASS; RESPONSE ANALYSIS; TEMPERATURE EFFECT;

EID: 72149103542     PISSN: 00224456     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)

1. 3+ doped ASG fiber with a long-period fiber gratings pair, Optics Express, 12 (2004) 651-656.
2. Lee J-H, Seo Y, Lim T-S, Bishop P L & Papautsky I, MEMS needle-type sensor array for in situ measurements of dissolved oxygen and redox potential, Environ Sci Technol, 41 (2007) 7857-7863. (Pubitemid 350133329)
3. Akashi T & Yoshimura Y, Deep reactive ion etching of boronsilicate glass using an anodically bonded silicon wafer as an etching mask, J Micromech Microeng, 16 (2006) 1051-1056.
4. Saito Y, Okamoto S, Inomata H & Kurachi J, Mechanism of the etching rate change of aluminosilicate glass in HF acid with micro-indentation, Appl Surface Sci, 255 (2008) 2260-2264.
5. Saito Y, Okamoto S, Inomata H, Kurachi J, Hidaka T & Kasai H, Mircro-fabrication techniques applied to aluminosilicate glass surfaces: micro-indentation and wet etching process, Thin Solid Films, 517 (2009) 2900-2904.
6. Bezerra M A, Santelli R E, Oliveira E P, Villar L S & Escaleira L A, Response surface methodology (RSM) as a tool for optimization in analytical chemistry, Talanta, 76 (2008) 665-677.
7. 2 using transformer couple plasma technique, Solid-State Electron, 46 (2002) 761-765.
8. Dabnun M A, Hashim M S J & El-Baradie M A, Surface roughness prediction model by design of experiments for turning machinable glass-ceramic (Macor), J Mater Process Technol, 164-165 (2005) 1286-1263.
9. Subramaniam S, Xue Q, Trabia M, Chen Y & Schill Jr R, Modelling and optimization of the chemical etching process in niobium cavities, in Proc Int Congress on Advanced Nuclear Power Plants (Hollywood) 2002, 1-6.
10. Kadirgama K & Abou-El-Hossein K A, Prediction of torque in milling by response surface methodology and neural network, Int J Modelling Simulation, 28 (2008) 1-7.
11. Koksal M A & Ugursal V I, Comparison of neural network, conditional demand analysis, and engineering approaches for modelling end-use energy consumption in the residential sector, Appl Ener, 85 (2008) 271-266.
12. Desai K M, Survase S A, Saudagar P S, Lele S S & Singhal R S, Comparison of artificial neural network (ANN) and response surface methodology (RSM) in fermentation media optimization: Case study of fermentation production of scleroglucan, Biochem Engg J, 41 (2008) 266-273.
13. th IASTED Int Multi-Conf: Artificial Intelligence and Application (Austria) 2002, 96-101.
14. Ko Y-D, Moon P, Kim C E, Ham M-H, Myoung J-M & Yun I, Modeling and optimization of the growth rate for ZnO thin films using neural networks and genetic algorithms, Expert Syst Applic, 36 (2006) 4061-4066.
15. 4 plasma using neural network, Thin Solid Films, 426 (2003) 8-15.
16. Shie J-R & Yang Y-K, Optimization of a photoresist coating process for photolithography in wafer manufacture via a radial basis neural network: a case study, Microelectron Engg, 85 (2008) 1664-1670.
17. Eki M & Takayuki S, Micromachining of fine ceramics by photolithography, Sensors Actuators A, 75 (1999) 278-288.
18. Argiolas N, Bazzan M, Bemardi A, Cattaruzza E, Mazzoldi P, Schiavuta P, Sada C & Hangen U, A systematic study of the chemical etching process on periodically poled lithium niobate structure, Mater Sci Engg B, 118 (2005) 150-154.