Optimizations of a photoresist coating process for photolithography in wafer manufacture via a radial basis neural network: A case study

Microelectronic Engineering

Volumn 85, Issue 7, 2008, Pages 1664-1670

  Shie, Jie Ren ^a   Yang, Yung Kuang ^a  

^a MINGHSIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

ANOVA; Optimization; Photoresist; Radial basis neural network

Indexed keywords

AEROSPACE APPLICATIONS; ANALYSIS OF VARIANCE (ANOVA); ARTIFICIAL INTELLIGENCE; CLADDING (COATING); COATING TECHNIQUES; COATINGS; CODES (SYMBOLS); COMPUTER NETWORKS; CONSTRAINED OPTIMIZATION; CONSTRAINT THEORY; CURVE FITTING; FEATURE EXTRACTION; FEEDFORWARD NEURAL NETWORKS; FUNCTION EVALUATION; INTEGER PROGRAMMING; LEARNING ALGORITHMS; LEARNING SYSTEMS; LEAST SQUARES APPROXIMATIONS; MATHEMATICAL PROGRAMMING; METEOROLOGY; METROPOLITAN AREA NETWORKS; MICROFLUIDICS; MOISTURE; NETWORK PROTOCOLS; NEURAL NETWORKS; NONLINEAR PROGRAMMING; OPTIMIZATION; PHOTORESISTORS; PHOTORESISTS; QUADRATIC PROGRAMMING; REGRESSION ANALYSIS; SURFACE TREATMENT; VEGETATION;

ANALYSIS OF VARIANCE (ANOVA); APPLIED (CO); CASE STUDIES; COATING PROCESSES; ELSEVIER (CO); HYBRID METHODS; NEW YORK (CO); NON UNIFORMITIES; O PTIMAL SETTING; OPTIMAL PARAMETERS; ORTHOGONAL ARRAYS; ORTHOGONAL LEAST SQUARES (OLS); PHOTORESIST (PR); PHOTORESIST (PR) COATINGS; PRACTICAL METHODS; QUALITY TARGETS; RADIAL BASIS; RADIAL BASIS NEURAL NETWORKS; RADIAL-BASIS FUNCTION (RBF); SEQUENTIAL QUADRATIC PROGRAMMING (SQP) METHOD; SPINNING RATE; SYSTEMATIC (CO); UNCONSTRAINED OPTIMIZATION;

RADIAL BASIS FUNCTION NETWORKS;

EID: 45249119968     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.04.019     Document Type: Article

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