Epitaxial growth and superhardness effect of TiN/AlON nanomultilayers synthesized by reactive magnetron sputtering technology

Journal of Alloys and Compounds

Volumn 485, Issue 1-2, 2009, Pages 435-438

  Kong, Ming ^a   Wu, Xiaoyan ^a   Huang, Bilong ^a   Li, Geyang ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Crystallization; Epitaxial growth; Nanomultilayer; Reactive sputtering; Superhardness effect

Indexed keywords

DEPOSITION CONDITIONS; ENERGY DISPERSIVE SPECTROMETRY; EPITAXIAL STRUCTURE; FIELD TRANSMISSION; GROWTH MODES; HIGH RESOLUTION; MAXIMUM HARDNESS; MICROSTRUCTURES AND MECHANICAL PROPERTIES; NANOMULTILAYERS; REACTIVE MAGNETRON SPUTTERING; SUPERHARDNESS EFFECT; TEMPLATE EFFECTS; X RAY DIFFRACTOMETRY;

ALUMINUM; CRYSTALLIZATION; GAS MIXTURES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETRONS; MECHANICAL PROPERTIES; MULTILAYERS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

EPITAXIAL GROWTH;

EID: 72049125313     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.05.133     Document Type: Article

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