In situ x-ray study of the oxidation of a vicinal NiAl(6,7,1) surface

New Journal of Physics

Volumn 11, Issue , 2009, Pages

  Ellinger, C ^a   Vonk, V ^a   Khorshidi, N ^a   Vlad A ^a   Stierle, A ^a   Dosch, H ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA FILMS; ALUMINA LAYERS; CLEAN SURFACES; DOMAIN FORMATION; HIGH-TEMPERATURE ANNEALING; IN-SITU; INTERFACIAL ATOMS; INTERFACIAL REGION; INTERFACIAL STRAIN; LONG-RANGE ORDERING; MASS TRANSPORT; NI ATOMS; REGULAR ARRAY; STEP STRUCTURE; STRAIN FIELDS; SURFACE OXIDE; SURFACE X-RAY DIFFRACTION; VICINAL NIAL; VICINAL SURFACE; X-RAY STUDIES;

ALUMINA; ALUMINUM; ATOMS; INTERFACIAL ENERGY; LANDFORMS; OXIDATION; SOIL CONSERVATION; X RAY DIFFRACTION;

SURFACE STRUCTURE;

EID: 72049118467     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/11/11/113004     Document Type: Article

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