Calculation of Cu/Ta interface electron transmission and effect on conductivity in nanoscale interconnect technology

Applied Physics Letters

Volumn 95, Issue 22, 2009, Pages

  Feldman, Baruch ^a,c   Dunham, Scott T ^a,b  

^a UNIVERSITY OF WASHINGTON   (United States)

^b University of Washington   (United States)

^c UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER LAYERS; CU-INTERCONNECTS; ELECTRON TRANSMISSION; INTERCONNECT TECHNOLOGY; NANO SCALE; NANOSCALE METALS; PERFORMANCE LIMITING FACTOR; SEMICLASSICAL MODEL;

INTEGRATED CIRCUITS; NANOSTRUCTURED MATERIALS; OPTICAL INTERCONNECTS; TANTALUM;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 71949124532     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3257700     Document Type: Article

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