The structure and stability of β-Ta thin films

Thin Solid Films

Volumn 479, Issue 1-2, 2005, Pages 166-173

  Jiang, Aiqin ^a   Tyson, Trevor A ^a   Axe, Lisa ^b   Gladczuk, Leszek ^b   Sosnowski, Marek ^b   Cote, Paul ^c  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^c Benet Laboratories   (United States)

Author keywords

tantalum; type Frank Kasper structure; Clusters; Molecular dynamics; Space group; X ray diffraction

Indexed keywords

COMPUTER SIMULATION; CRYSTALLINE MATERIALS; DIFFRACTOMETERS; MAGNETRON SPUTTERING; MOLECULAR ORIENTATION; MOLECULAR STRUCTURE; SILICA; SILICON WAFERS; SUBSTRATES; TANTALUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

Σ-TYPE FRANK-KASPER STRUCTURE; CLUSTERS; SPACE GROUP; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 15344339648     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.006     Document Type: Article

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