A novel technique for microstructure characterization of garnet films

Optical Materials

Volumn 32, Issue 2, 2009, Pages 315-322

  Wo, P C ^a   Munroe, P R ^a   Vasiliev, M ^b   Xie, Z H ^b   Alameh, K ^b   Kotov, V ^c  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b EDITH COWAN UNIVERSITY   (Australia)

^c INSTITUTE OF RADIO ENGINEERING AND ELECTRONICS   (Russian Federation)

Author keywords

Focused ion beam (FIB); Magneto optical materials; Microstructure; Transmission electron microscopy (TEM)

Indexed keywords

CHARACTERIZATION; FOCUSED ION BEAMS; GARNETS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICROSTRUCTURE; OPTICAL COMMUNICATION; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

EXPERIMENTAL PROCEDURE; FOCUSED ION BEAM MILLING; MAGNETIC PHOTONIC CRYSTALS; MAGNETO-OPTICAL MATERIALS; MAGNETOOPTICAL PROPERTIES; MANUFACTURING PROCESS; MICROSTRUCTURE CHARACTERIZATION; OPTICAL INTEGRATED CIRCUITS;

OPTICAL PROPERTIES;

EID: 71849102699     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2009.07.025     Document Type: Article

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