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Volumn 106, Issue 10, 2009, Pages

In situ observation of the elastic deformation of a single epitaxial SiGe crystal by combining atomic force microscopy and micro x-ray diffraction

(10) Rodrigues, M S a Cornelius, T W a Scheler, T a Mocuta, C a Malachias, A a Magalhaes Paniago R a Dhez, O a Comin, F a Metzger, T H a Chevrier, J a,b

a EUROPEAN SYNCHROTRON RADIATION FACILITY (France)

b CNRS (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; BRAGG SCATTERING; CENTER OF MASS; CONTACT STIFFNESS; DISPLACEMENT FIELD; ELASTIC BEHAVIOR; IN-SITU; IN-SITU OBSERVATIONS; LATTICE PARAMETERS; MICRO X RAY DIFFRACTION; NANOSIZED OBJECTS; REDUCED ELASTIC MODULUS; RESONANCE FREQUENCIES; SELF-ASSEMBLED; SIGE ISLANDS; TUNING FORKS;

ATOMIC FORCE MICROSCOPY; ATOMS; DIFFRACTION; NATURAL FREQUENCIES; SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON ALLOYS; TUNING; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ELASTIC MODULI;

EID: 71749085253 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3262614 Document Type: Article

Times cited : (20)

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