Nano-indentation of copper thin films on silicon substrates

Scripta Materialia

Volumn 41, Issue 9, 1999, Pages 951-957

  Suresh, S ^a   Nieh, T G ^b   Choi, B W ^b  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; DISLOCATIONS (CRYSTALS); MECHANICAL PROPERTIES; MICROELECTRONICS; NANOTECHNOLOGY; NUCLEATION; POLYCRYSTALLINE MATERIALS; SHEAR STRENGTH; SHEAR STRESS; SILICON; SUBSTRATES; THIN FILMS;

DISLOCATION NUCLEATION; NANOINDENTATION;

COPPER;

EID: 0033353163     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(99)00245-6     Document Type: Article

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