Field-effect control of electroosmotic pumping using porous silicon-silicon nitride membranes

Journal of Microelectromechanical Systems

Volumn 18, Issue 6, 2009, Pages 1173-1183

  Vajandar, Saumitra K ^a   Xu, Dongyan ^b   Sun, Jiashu ^a   Markov, Dmitry A ^a   Hofmeister, William H ^c   Li, Deyu ^a  

^a VANDERBILT UNIVERSITY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF TENNESSEE SPACE INSTITUTE   (United States)

Author keywords

Electrolytic rectification; Electroosmotic pumping; Field effect flow control; Porous silicon

Indexed keywords

APPLIED ELECTRIC FIELD; CHANNEL WALL; CONDUCTING ELECTRODES; CURRENT LEAKAGE; ELECTROOSMOTIC FLOW; ELECTROOSMOTIC PUMPING; FIELD-EFFECT; FIELD-EFFECT FLOW CONTROL; FLOWTHROUGH; GATE POTENTIALS; GATE VOLTAGES; HEAVILY DOPED; HIGH-FLOW RATE; NEGATIVE GATE; NOVEL METHODS; POROUS MEMBRANES; POSITIVE GATE BIAS; RECTIFICATION EFFECTS; SILICON NITRIDE MEMBRANE; SINGLE MICROCHANNEL; VELOCITY ENHANCEMENT;

ELECTRIC FIELDS; ELECTRIC RECTIFIERS; ELECTROMAGNETIC PUMPS; ELECTROOSMOSIS; FLOW CONTROL; FLOW VELOCITY; MEMBRANES; SILICON NITRIDE; ZETA POTENTIAL;

POROUS SILICON;

EID: 71549157122     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2009.2031692     Document Type: Article

References (55)

1. C. H. Chen and J. G. Santiago, "A planar electroosmotic micropump," J. Microelectromech. Syst., vol.11, no.6, pp. 672-683, Dec. 2002.
2. S. H. Yao, D. E. Hertzog, S. L. Zeng, J. C. Mikkelsen, and J. G. Santiago, "Porous glass electroosmotic pumps: Design and experiments," J. Colloid Interface Sci., vol.268, no.1, pp. 143-153, Dec. 2003.
3. S. H. Yao, A. M. Myers, J. D. Posner, K. A. Rose, and J. G. Santiago, "Electroosmotic pumps fabricated from porous silicon membranes," J. Microelectromech. Syst., vol.15, no.3, pp. 717-728, Jun. 2006.
4. J. A. Tripp, F. Svec, J. M. J. Frechet, S. L. Zeng, J. C. Mikkelsen, and J. G. Santiago, "High-pressure electroosmotic pumps based on porous polymer monoliths," Sens. Actuators B, Chem., vol.99, no.1, pp. 66-73, Apr. 2004.
5. S. Yao, A. M. Myers, J. D. Posner, and J. G. Santiago, "Electroosmotic pumps fabricated from porous silicon membranes," in Proc. Int. Mech. Eng. Congr. Expo., Anaheim, CA, 2004, pp. 1-6.
6. P. H. Paul and D. J. Rakestraw, "Electrokinetic high-pressure hydraulic system," U.S. Patent 6019 882, Feb. 1, 2000.
7. D. J. Laser, S. H. Yao, C. Chen, J. C. Mikkelsen, K. E. Goodson, J. G. Santiago, and T. W. Kenny, "A low-voltage silicon micromachined parallel-plate electrokinetic pump," in Proc. 11th Int. Conf. Solid-State Sensors Actuators, Munich, Germany, 2001, pp. 920-923.
8. R. M. McCormick, "Capillary zone electrophoretic separation of peptides and proteins using low pH buffers in modified silica capillaries," Anal. Chem., vol.60, no.21, pp. 2322-2328, Nov. 1988.
9. W. J. Lambert and D. L. Middleton, "pH hysteresis effect with silica capillaries in capillary zone electrophoresis," Anal. Chem., vol.62, no.15, pp. 1585-1587, Aug. 1990.
10. C. Schwer and E. Kenndler, "Electrophoresis in fused-silica capillaries-The influence of organic-solvents on the electroosmotic velocity and the zeta-potential," Anal. Chem., vol.63, no.17, pp. 1801-1807, Sep. 1991.
11. J. W. Jorgenson and K. D. Lukacs, "Capillary zone electrophoresis," Science, vol.222, no.4621, pp. 266-272, Oct. 1983.
12. S. Hjerten, "High-performance electrophoresis-Elimination of elec-troendosmosis and solute adsorption," J. Chromatogr., vol.347, pp. 191-198, 1985.
13. S. K. Vajandar, D. Y. Xu, D. A. Markov, J. P. Wikswo, W. Hofmeister, and D. Y. Li, "SiO2-coated porous anodic alumina membranes for high flow rate electroosmotic pumping," Nanotechnology, vol.18, no.27, p. 275 705, Jul. 2007.
14. C. S. Lee, W. C. Blanchard, and C. T. Wu, "Direct control of the electro-osmosis in capillary zone electrophoresis by using an external electric-field," Anal. Chem., vol.62, no.14, pp. 1550-1552, Jul. 1990.
15. K. Ghowsi and R. J. Gale, "Field-effect electroosmosis," J. Chromatogra-phy, vol. 559, no. 1/2, pp. 95-101, Oct. 1991.
16. M. A. Hayes and A. G. Ewing, "Electroosmotic flow-control and monitoring with an applied radial voltage for capillary zone electrophoresis," Anal. Chem., vol.64, no.5, pp. 512-516, Mar. 1992.
17. M. A. Hayes, I. Kheterpal, and A. G. Ewing, "Effects of buffer Ph on electroosmotic flow-control by an applied radial voltage for capillary zone electrophoresis," Anal. Chem., vol.65, no.1, pp. 27-31, Jan. 1993.
18. M. A. Hayes, I. Kheterpal, and A. G. Ewing, "Electroosmotic flow-control and surface conductance in capillary zone electrophoresis," Anal. Chem., vol.65, no.15, pp. 2010-2013, Aug. 1993.
19. N. A. Polson and M. A. Hayes, "Electroosmotic flow control of fluids on a capillary electrophoresis microdevice using an applied external voltage," Anal. Chem., vol.72, no.5, pp. 1088-1092, Mar. 2000.
20. C. T. Wu, T. Lopes, B. Patel, and C. S. Lee, "Effect of direct control of electroosmosis on peptide and protein separations in capillary elec-trophoresis," Anal. Chem., vol.64, no.8, pp. 886-891, Apr. 1992.
21. R. B. M. Schasfoort, S. Schlautmann, L. Hendrikse, and A. van den Berg, "Field-effect flow control for microfabricated fluidic networks," Science, vol.286, no.5441, pp. 942-945, Oct. 1999.
22. E. J. van der Wouden, T. Heuser, D. C. Hermes, R. E. Oosterbroek, J. G. E. Gardeniers, and A. van den Berg, "Field-effect control of electro-osmotic flow in microfluidic networks," Colloids Surf. A, Physicochem. Eng. Asp., vol.267, no.1-3, pp. 110-116, Oct. 2005.
23. J. S. Buch, P. C. Wang, D. L. DeVoe, and C. S. Lee, "Field-effect flow control in a polydimethylsiloxane-based microfluidic system," Electrophore-sis, vol.22, no.18, pp. 3902-3907, Oct. 2001.
24. R. Karnik, R. Fan, M. Yue, D. Y. Li, P. D. Yang, and A. Majumdar, "Electrostatic control of ions and molecules in nanofluidic transistors," Nano Lett., vol.5, no.5, pp. 943-948, May 2005.
25. Z. Chen, P. Wang, and H.-C. Chang, "An electro-osmotic micro-pump based on monolithic silica for micro-flow analyses and electro-sprays," Anal. Bioanal. Chem., vol.382, no.3, pp. 817-824, Jun. 2005.
26. S. L. Zeng, C. H. Chen, J. C. Mikkelsen, and J. G. Santiago, "Fabrication and characterization of electroosmotic micropumps," Sens. Actuators B, Chem., vol.79, no.2, pp. 107-114, Oct. 2001.
27. S. L. Zeng, C. H. Chen, J. G. Santiago, J. R. Chen, R. N. Zare, J. A. Tripp, F. Svec, and J. M. J. Frechet, "Electroosmotic flow pumps with polymer frits," Sens. Actuators B, Chem., vol. 82, no. 2/3, pp. 209-212, Feb. 2002.
28. W. E. Gan, L. Yang, Y. Z. He, R. H. Zeng, M. L. Cervera, and M. de la Guardia, "Mechanism of porous core electroosmotic pump flow injection system and its application to determination of chromium(VI) in waste-water," Talanta, vol.51, no.4, pp. 667-675, Apr. 2000.
29. C. Y. Lee, G. B. Lee, L. M. Fu, K. H. Lee, and R. J. Yang, "Electrokineti-cally driven active micro-mixers utilizing zeta potential variation induced by field effect," J. Micromech. Microeng., vol.14, no.10, pp. 1390-1398, Oct. 2004.
30. A. J. Bard and L. R. Faulkner, Electrochemical Methods. New York: Wiley, 1980.
31. M. J. Madou, Fundamentals of Microfabrication-The Science of Miniaturization., 2nd ed. Boca Raton, FL: CRC Press, 2002.
32. T. L. Huang, P. Tsai, C. T. Wu, and C. S. Lee, "Mechanistic studies of electroosmotic control at the capillary solution interface," Anal. Chem., vol.65, no.20, pp. 2887-2893, Oct. 1993.
33. C. S. Lee, D. McManigill, C. T. Wu, and B. Patel, "Factors affecting direct control of electroosmosis using an external electric-field in capillary electrophoresis," Anal. Chem., vol.63, no.15, pp. 1519-1523, Aug. 1991.
34. H. Poppe, A. Cifuentes, and W. T. Kok, "Theoretical description of the influence of external radial fields on the electroosmotic flow in capillary electrophoresis," Anal. Chem., vol.68, no.5, pp. 888-893, 1996.
35. K. H. Bu and B. M. Moudgil, "Selective chemical mechanical polishing using surfactants," J. Electrochem. Soc., vol.154, no.7, pp. H631-H635, 2007.
36. S. Hegde and S. V. Babu, "Study of surface charge effects on oxide and nitride planarization using alumina/ceria mixed abrasive slurries," Electrochem. Solid State Lett., vol.7, no.12, pp. G316-G318, 2004.
37. L. Bousse and S. Mostarshed, "The zeta-potential of silicon-nitride thin-films," J. Electroanal. Chem., vol.302, pp. 269-274, 1991.
38. D. A. Buchanan, "Scaling the gate dielectric: Materials, integration, and reliability," IBM J. Res. Develop., vol.43, no.3, pp. 245-264, 1999.
39. T. P. Ma, "Making silicon nitride film a viable gate dielectric," IEEE Trans. Electron Devices, vol.45, no.3, pp. 680-690, Mar. 1998.
40. M. Depas, T. Nigam, and M. M. Heyns, "Soft breakdown of ultra-thin gate oxide layers," IEEE Trans. Electron Devices, vol.43, no.9, pp. 1499-1504, Sep. 1996. (Pubitemid 126770460)
41. W. D. Brown and M. A. Khaliq, Silicon Nitride for Application as the Gate Dielectric in MOS Devices. Little Rock, AR: Univ. Arkansas.
42. H. Wong and V. A. Gritsenko, "Defects in silicon oxynitride gate dielectric films," Microelectron. Reliab., vol. 42, no. 4/5, pp. 597-605, Apr./May 2002.
43. P. J. Wright and K. C. Saraswat, "The effect of fluorine in silicon dioxide gate dielectrics," IEEE Trans. Electron Devices, vol.36, no.5, pp. 879-889, May 1989.
44. Y. C. Yeo, Q. Lu, W. C. Lee, T. J. King, C. M. Hu, X. W. Wang, X. Guo, and T. P. Ma, "Direct tunneling gate leakage current in transistors with ultrathin silicon nitride gate dielectric," IEEE Electron Device Lett., vol.21, no.11, pp. 540-542, Nov. 2000.
45. M. J. Madou, K. W. Frese, and S. R. Morrison, "Electron exchange at the surface of thermally grown silica," J. Electrochem. Soc., vol.126, no.10, pp. 1827-1828, 1979.
46. M. J. Madou, K. W. Frese, and S. R. Morrison, "Silicon-silica electrode," Phys. Stat. Sol. A, Appl. Res., vol.57, no.2, pp. 705-712, Feb. 1980.
47. S. R. Morrison, Electrochemistry at Semiconductor and Oxidized Metal Electrodes. New York: Plenum, 1980.
48. D. J. DiMaria, "Defects and impurities in thermal SiO2," in Physics of SiO2 and its Interfaces, S. T. Pantelides, Ed. New York: Pergamon, 1978.
49. Y. G. Vlasov, Y. A. Tarantov, and P. V. Bobrov, "Analytical characteristics and sensitivity mechanisms of electrolyte-insulator- semiconductor system-based chemical sensors-A critical review," Anal. Bioanal. Chem., vol.376, no.6, pp. 788-796, Jul. 2003.
50. V. I. Belyi, F. A. Kuznetsov, T. P. Smirnova, L. V. Chramova, and L. K. Kravchenko, "Chemical non-uniformity of thin dielectric films produced by ammonolysis of monosilane," Thin Solid Films, vol.37, pp. L39-L42, 1976.
51. K. Chen, G. Li, H. Lu, and L. Chen, "Effect of total hydrogen content in silicon nitride sensitive film on performance of ISFET," Sens. Actuators B, Chem., vol.12, no.1, pp. 23-27, Mar. 1993.
52. G. T. Yu and S. K. Yen, "Hydrogen ion diffusion coefficient of silicon nitride thin films," Appl. Surf. Sci., vol. 202, no. 1/2, pp. 68-72, Dec. 2002.
53. V. N. Doshi, T. Niuya, and M. Yang, Silicon Nitride Dopant Diffusion Barrier in Integrated Circuits. Dallas, TX: Texas Instruments Incorporated, 2001.
54. A. Izumi, H. Sato, and H. Matsumura, "Formation of high moisture and dopant diffusion resistivity silicon nitride films by catalytic-CVD method," J. Phys. IV, vol.11, pp. 901-906, 2001.
55. J. Sun, S. K. Vajandar, D. Y. Xu, Y. Kang, G. Hu, D. Q. Li, and D. Li, "Experimental characterization of electrical current leakage in PDMS microfluidic devices," Microfluid. Nanofluid., vol.6, no.5, pp. 589-598, May 2008.