|
|
Volumn 11, Issue 3, 2001, Pages
|
|
Formation of high moisture and dopant diffusion resistivity silicon nitride films by catalytic-CVD method
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ANNEALING;
CATALYTIC CRACKING;
DIFFUSION IN SOLIDS;
DOPING (ADDITIVES);
MOISTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
SILICON NITRIDE;
SUBSTRATES;
SILICON NITRIDE FILMS;
ULTRATHIN FILMS;
|
|
EID: 0034849447
PISSN: 11554339
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1051/jp4:20013112 Document Type: Conference Paper |
|
Times cited : (2)
|
|
References (10)
|
