Study of surface charge effects on oxide and nitride planarization using alumina/ceria mixed abrasive slurries

Electrochemical and Solid-State Letters

Volumn 7, Issue 12, 2004, Pages

  Hegde, Sharath ^a   Babu, S V ^a  

^a Clarkson University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; ALUMINA; CERIUM COMPOUNDS; ELECTRIC CHARGE; PH EFFECTS; SLURRIES; SURFACE CHEMISTRY; SURFACE REACTIONS;

CHEMICAL MECHANICAL PLANARIZATION (CMP); MIXED ABRASIVE SLURRIES; SHALLOW TRENCH ISOLATION (STI); SURFACE CHARGE EFFECTS;

ELECTROLYTIC POLISHING;

EID: 10944222244     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1813231     Document Type: Article

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